ABSTRACT
Purpose@#This pilot study was conducted to evaluate half-value layer (HVL) measurements obtained using a semi conductor dosimeter for intraoral radiography. @*Materials and Methods@#This study included 8 aluminum plates, 4 of which were low-purity (less than 99.9%) and 4 high-purity (greater than 99.9%). Intraoral radiography was performed using an intraoral X-ray unit in accordance with the dental protocol at the authors’ affiliated hospital: tube voltage, 60 kVp and 70 kVp; tube current, 7 mA;and exposure time, 0.10 s. The accuracy of HVL measurements for intraoral radiography was assessed using a semiconductor dosimeter. A simple regression analysis was performed to compare the aluminum plate thickness and HVL in relation to the tube voltage (60 kVp and 70 kVp) and aluminum purity (low and high). @*Results@#For the low-purity aluminum plates, the HVL at 60 kVp (Y) and 70 kVp (Y) was significantly correlated with the thickness of the aluminum plate (X), with Y = 1.708 + 0.415X (r = 0.999, P<0.05) and Y = 1.980 + 0.484X (r = 0.999, P<0.05), respectively. Similarly, for the high-purity aluminum plates, the HVL at 60 kVp (Y) and 70 kVp (Y) was significantly correlated with the plate thickness (X), with Y = 1.696 + 0.454X (r = 0.999, P<0.05) and Y = 1.968 + 0.515X (r = 0.998, P<0.05), respectively. @*Conclusion@#This pilot study examined the relationship between aluminum plate thickness and HVL measurements using a semiconductor dosimeter for intraoral radiography. Semiconductor dosimeters may prove useful in HVL measurement for purposes such as quality assurance in dental X-ray imaging.