Sodium hypochlorite effects on dentin bond strength and acid-base resistant zone formation by adhesive systems

ABSTRACT

Aim: To evaluate the effects of 10% NaOCl gel application on the dentin bond strengths and morphology of resin-dentin interfaces formed by three adhesives. Methods: Two etch-and-rinseadhesives (One-Step Plus, Bisco Inc. and Clearfil Photo Bond, Kuraray Noritake Dental) and oneself-etch adhesive (Clearfil SE Bond, Kuraray Noritake Dental) were applied on dentin accordingto the manufacturers’ instructions or after the treatment with 10% NaOCl (ED-Gel, Kuraray NoritakeDental) for 60 s. For interfacial analysis, specimens were subjected to acid-base challenge andobserved by SEM to identify the formation of the acid-base resistant zone (ABRZ). For microtensilebond strength, the same groups were investigated and the restored teeth were thermocycled(5,000 cycles) or not before testing. Bond strength data were subjected to two-way ANOVA andTukey’s test (p<0.05). Results: NaOCl application affected the bond strengths for One-Step Plusand Clearfil Photo Bond. Thermocycling reduced the bond strengths for Clearfil Photo Bond andClearfil SE Bond when used after NaOCl application and One-Step Plus when used asrecommended by manufacturer. ABRZ was observed adjacent to the hybrid layer for self-etchprimer. The etch-and-rinse systems showed external lesions after acid-base challenge and noABRZ formation when applied according to manufacturer’s instructions. Conclusions:10% NaOClchanged the morphology of the bonding interfaces and its use with etch-&-rinse adhesives reducedthe dentin bond strength. Formation of ABRZ was material-dependent and the interface morphologieswere different among the tested materials.