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Evaluation of the Phototoxic Potential of Some Quinolone Antibiotics / 대한피부과학회지
Korean Journal of Dermatology ; : 1021-1028, 1995.
Article in Korean | WPRIM | ID: wpr-206056
ABSTRACT

BACKGROUND:

The photsensitizing effect of quinolones has been recognized since their introdulation as an antibacterial agents. Recently several new second eneration antibacterial agents of this pharmacological class have become available for therapy, and are gaining increasing impotance.

OBJECTIVE:

To reveal the phototoxic potentials of some new quinolones by photohemolysis test, estimation of fluorescenc spectra, and Candida albicans test.

METHODS:

Nalidixic acid and four second-generation quinolones(ciprofloxacin, enoxacini, norfloxacin, and ofloxacitid were examined by fluorescence spertra which measured t.he phototoxc potentials by photochemial instability, photohemolsis test for the phototoxic properties against cell membranes and Candida tlbicans test for phototoxic properties against DNA.

RESULTS:

All drugs showed a fluorescence spectra within 360 nm to 450 nm, and in the photohemolysis test, all studied drug except ofloxacin got above 5% hemolytic value, and all drugs showed clear zone. in Candida albicans test after 48hours.

CONCLUSION:

These results suggested that all tested drugs were photochemically unstable. According to the mechanisris of cellular phototoxicity, ciprofloxacin, enoxacin, and norfloxacin was phtototoxic to nucleus and cell membrane, whereas ofloxacin was phototoxic to nucleus only.
Subject(s)

Full text: Available Index: WPRIM (Western Pacific) Main subject: Candida / Candida albicans / DNA / Enoxacin / Ofloxacin / Ciprofloxacin / Nalidixic Acid / Norfloxacin / Cell Membrane / Dermatitis, Phototoxic Language: Korean Journal: Korean Journal of Dermatology Year: 1995 Type: Article

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Full text: Available Index: WPRIM (Western Pacific) Main subject: Candida / Candida albicans / DNA / Enoxacin / Ofloxacin / Ciprofloxacin / Nalidixic Acid / Norfloxacin / Cell Membrane / Dermatitis, Phototoxic Language: Korean Journal: Korean Journal of Dermatology Year: 1995 Type: Article