The effect of additional enamel etching on microleakage of the adhesion of self-etching primer system / 대한치과보존학회지

ABSTRACT

The purpose of this study is to evaluate the effect of additional enamel etching with phosphoric acid on the microleakage of the adhesion of self-etching primer system. Class V cavity(4 mmx3 mmx1.5 mm) preparations with all margins in enamel were prepared on buccal surface of 42 extracted human upper central incisor teeth. Prepared teeth were randomly divided into 3 groups. Group 1 no additional pretreatment with 37% phosphoric acid (NE). Group 2 additional pretreatment with 37% phosphoric acid for 10 seconds (E10s). Group 3 additional pretreatment with 37% phosphoric acid for 20 seconds (E20s). The adhesives(Clearfil SE Bond(R), Kuraray, Osaka, Japan) and composite resins(Clearfil AP-X(R), Osaka, Kuraray, Japan) were applied following the manufacturer's instructions. All the specimens were finished with the polishing disc(3M dental product, St Paul, MN, USA), thermocycled for 500 cycles between 5degrees C and 55degrees C and resected apical 3-mm root. 0.028 stainless steel wire was inserted apically into the pulp chamber of each tooth and sealed into position with sticky wax. Surrounding tooth surface was covered with a nail varnish 2 times except areas 1 mm far from all the margins. After drying for one day, soaked the samples in the distilled water. Microleakage was assessed by electrochemical method(System 6514, Electrometer(R), Keithley, USA) in the distilled water. In this study, the microleakage was the lowest in group 1(NE) and the highest in group 3(E20s)(NEenamel etching has no influence on the microleakage of the adhesion of self-etching primer system.