Pesticide Application, Dermal Exposure Risk And Factors Influenced Distribution On Different Body Parts Among Agriculture Workers
Malaysian Journal of Public Health Medicine
;
: 123-132, 2017.
Artículo
en Inglés
| WPRIM
| ID: wpr-751131
ABSTRACT
@#Agriculture sector accounts significant numbers of injuries and fatalities in the workplace particularly related to pesticide management. Among three main pathways of pesticide exposure, dermal contact is the most common route, which exposure usually occurs during pesticide mixing/loading, application, harvesting and other farming activities. This review aims to present and discuss several vital components of pesticide dermal exposure among agriculture workers, as well as pesticide application in agriculture sector in Malaysia involving different commodity agriculture sub-sectors. Pesticide exposure was discussed from perspective of three pesticide management activities (i.e. preparation, application and cleaning) that contribute to the risk of exposure through three routes (i.e. emission, deposition, transfer). Moreover, this paper also discussed pesticide dermal exposure risk assessment methods which can be defined into exposure assessment and effect assessment. The exposure rate was affected by various factors such as application equipment, application rate and duration, type of pesticide formulation, pesticide management stage, usage of personal protective equipment, training and aptitude of the applicator as well as environmental factors (i.e. temperature, humidity, wind speed and direction). The factors mention earlier have been used to explain the exposure distribution over different parts of the body and support the fact that pesticide type was not a major factor in total exposure.
Texto completo:
Disponible
Índice:
WPRIM (Pacífico Occidental)
Asunto principal:
Plaguicidas
Tipo de estudio:
Estudio de etiología
/
Factores de riesgo
Idioma:
Inglés
Revista:
Malaysian Journal of Public Health Medicine
Año:
2017
Tipo del documento:
Artículo
Similares
MEDLINE
...
LILACS
LIS