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1.
From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications.
Small
; 16(22): e1907506, 2020 Jun.
Artículo
en Inglés
| MEDLINE | ID: mdl-32346997
2.
Potential Precursor Alternatives to the Pyrophoric Trimethylaluminium for the Atomic Layer Deposition of Aluminium Oxide.
Chemistry
; 25(31): 7489-7500, 2019 Jun 04.
Artículo
en Inglés
| MEDLINE | ID: mdl-30870572
3.
Unearthing [3-(Dimethylamino)propyl]aluminium(III) Complexes as Novel Atomic Layer Deposition (ALD) Precursors for Al2 O3 : Synthesis, Characterization and ALD Process Development.
Chemistry
; 23(45): 10768-10772, 2017 Aug 10.
Artículo
en Inglés
| MEDLINE | ID: mdl-28665519
4.
PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads.
ACS Appl Mater Interfaces
; 10(8): 7422-7434, 2018 Feb 28.
Artículo
en Inglés
| MEDLINE | ID: mdl-29338170
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