PEG-stabilized core-shell nanoparticles: impact of linear versus dendritic polymer shell architecture on colloidal properties and the reversibility of temperature-induced aggregation.

Superparamagnetic iron oxide nanoparticles (SPIONs) have been widely used experimentally and also clinically tested in diverse areas of biology and medicine. Applications include magnetic resonance imaging, cell sorting, drug delivery, and hyperthermia. Physicochemical surface properties are particularly relevant in the context of achieving high colloidal nanoparticle (NP) stability and preventing agglomeration (particularly challenging in biological fluids), increasing blood circulation time, and possibly targeting specific cells or tissues through the presentation of bioligands. Traditionally, NP surfaces are sterically stabilized with hydrophilic polymeric matrices, such as dextran or linear poly(ethylene glycol) brushes. While dendrimers have found applications as drug carriers, dispersants with dendritic ("dendrons") or hyperbranched structures have been comparatively neglected despite their unique properties, such as a precisely defined molecular structure and the ability to present biofunctionalities at high density at the NP periphery. This work covers the synthesis of SPIONs and their stabilization based on poly(ethylene glycol) (PEG) and oligo(ethylene glycol) (OEG) chemistry and compares the physicochemical properties of NPs stabilized with linear and dendritic macromolecules of comparable molecular weight. The results highlight the impact of the polymeric interface architecture on solubility, colloidal stability, hydrodynamic radius, and thermoresponsive behavior. Dendron-stabilized NPs were found to provide excellent colloidal stability, despite a smaller hydrodynamic radius and lower degree of soft shell hydration compared to linear PEG analogues. Moreover, for the same grafting density and molecular weight of the stabilizers, OEG dendron-stabilized NPs show a reversible temperature-induced aggregation behavior, in contrast to the essentially irreversible aggregation and sedimentation observed for the linear PEG analogues. This new class of dendritically stabilized NPs is believed to have a potential for future biomedical and other applications, in which stability, resistance to (or reversible) aggregation, ultrasmall size (for crossing biological barriers or inclusion in responsive artificial membranes), and/or high corona density of (bio)active ligands are key.

Polyoxazolines for nonfouling surface coatings--a direct comparison to the gold standard PEG.

The prevention of surface fouling is becoming increasingly important for the development of anti-infective medical implants, biosensors with improved signal-to-noise ratios, and low-fouling membranes to name a few examples. We review a direct comparison of poly(ethylene glycol), the gold standard polymer to impart surfaces with nonfouling properties, to an alternative polymer, poly(2-methyl-2-oxazoline) (PMOXA), and show that both polymers are equally excellent in rendering surfaces nonfouling while PMOXA coatings are more stable in oxidative environments. We discuss prerequisites for the fabrication of nonfouling surface coatings and implications for the polymer choice according to application requirements.

Comparative stability studies of poly(2-methyl-2-oxazoline) and poly(ethylene glycol) brush coatings.

Non-fouling surfaces that resist non-specific adsorption of proteins, bacteria, and higher organisms are of particular interest in diverse applications ranging from marine coatings to diagnostic devices and biomedical implants. Poly(ethylene glycol) (PEG) is the most frequently used polymer to impart surfaces with such non-fouling properties. Nevertheless, limitations in PEG stability have stimulated research on alternative polymers that are potentially more stable than PEG. Among them, we previously investigated poly(2-methyl-2-oxazoline) (PMOXA), a peptidomimetic polymer, and found that PMOXA shows excellent anti-fouling properties. Here, we compare the stability of films self-assembled from graft copolymers exposing a dense brush layer of PEG and PMOXA side chains, respectively, in physiological and oxidative media. Before media exposure both film types prevented the adsorption of full serum proteins to below the detection limit of optical waveguide in situ measurements. Before and after media exposure for up to 2 weeks, the total film thickness, chemical composition, and total adsorbed mass of the films were quantified using variable angle spectroscopic ellipsometry (VASE), X-ray photoelectron spectroscopy (XPS), and optical waveguide lightmode spectroscopy (OWLS), respectively. We found (i) that PMOXA graft copolymer films were significantly more stable than PEG graft copolymer films and kept their protein-repellent properties under all investigated conditions and (ii) that film degradation was due to side chain degradation rather than due to copolymer desorption.

Micropatterning of functional conductive polymers with multiple surface chemistries in register.

A versatile procedure is presented for fast and efficient micropatterning of multiple types of covalently bound surface chemistry in perfect register on and between conductive polymer microcircuits. The micropatterning principle is applied to several types of native and functionalized PEDOT (poly(3,4-ethylenedioxythiophene)) thin films. The method is based on contacting PEDOT-type thin films with a micropatterned agarose stamp containing an oxidant (aqueous hypochlorite) and applying a nonionic detergent. Where contacted, PEDOT not only loses its conductance but is entirely removed, thereby locally revealing the underlying substrate. Surface analysis showed that the substrate surface chemistry was fully exposed and not affected by the treatment. Click chemistry could thus be applied to selectively modify re-exposed alkyne and azide functional groups of functionalized polystyrene substrates. The versatility of the method is illustrated by micropatterning cell-binding RGD-functionalized PEDOT on low cell-binding PMOXA (poly(2-methyl-2-oxazoline)) to produce cell-capturing microelectrodes on a cell nonadhesive background in a few simple steps. The method should be applicable to a wide range of native and chemically functionalized conjugated polymer systems.

3D ordered nanostructures fabricated by nanosphere lithography using an organometallic etch mask.

A new approach for fabricating porous structures on silicon substrates and on polymer surfaces, using colloidal particle arrays with a polymer mask of a highly etch-resistant organometallic polymer, is demonstrated. Monolayers of silica particles, with diameters of 60 nm, 150 nm, 300 nm, or 500 nm, were deposited either on a silicon substrate or on a surface coated with polyethersulfone (PES), and the voids of the arrays were filled with poly(ferrocenylmethylphenylsilane) (PFMPS). Argon ion sputtering removed the excess PFMPS on the particles which enabled removal of the particles with HF. Further pattern transfer steps with reactive ion etching for different time intervals provided structures in silicon or in a PES layer. Free-standing PES membranes exhibiting regular arrays of circular holes with high porosity were fabricated by using cellulose acetate as a sacrificial layer. The pores obtained on silicon substrates after etching were used as molds for nanoimprint lithography (NIL). A combination of the techniques of nanosphere lithography (NSL) and NIL has resulted in 3D nanostructures with a hemispherical shape (inherited from the nanoparticles) which was obtained both in silicon and in PMMA.

Direct surface structuring of organometallic resists using nanoimprint lithography.

The availability of suitable resist materials is essential for nanoimprint lithography (NIL). In this work, the application of poly(ferrocenylmethylphenylsilane) (PFMPS) as a new type of imprint resist is reported. As PFMPS contains iron and silicon in the main chain, it possesses a very high resistance to reactive ion etching. Polymer patterns formed after imprinting were transferred into silicon substrates owing to the high etch resistivity of PFMPS. The parameters for imprinting, such as polymer molar mass and initial film thickness, were investigated. A decrease in the initial film thickness facilitated the residual layer removal, as well as the pattern transfer. Only upon complete removal of the residual layer with argon plasma did pattern transfer result in aspect ratios up to 4:1 and less surface roughness.

Nanoscale patterning by UV nanoimprint lithography using an organometallic resist.

This paper presents the fabrication of poly(ferrocenylmethylphenylsilane) (PFMPS) patterns by step-and-flash imprint lithography for use as high-contrast etch masks in dry etch processes. PFMPS was spin-coated onto a resist template made by UV nanoimprint lithography to create a reactive ion etch resist layer with a thickness variation corresponding to the imprinted pattern. Etching back the excess of PFMPS by argon sputtering revealed the imprinted organic resist material, which was subsequently removed by oxygen plasma. PFMPS lines down to 30 nm were obtained after removal of the organic resist by oxygen plasma. Because PFMPS contains iron and silicon atoms in its main chain, it possesses a high resistance to oxygen reactive ion etching and, e.g., CHF(3)/O(2) or SF(6)/O(2) reactive ion etch processes. PFMPS patterns formed after imprinting were subsequently transferred into the underlying silicon substrate, and etch rates of 300 nm/min into Si and around 1 nm/min into the PFMPS layer were achieved, resulting in an etch contrast of approximately 300.