Periodic nanostructures on Si(100) surfaces generated by high-repetition rate sub-15 fs pulsed near-infrared laser light.

Nanoscale rifts and ripples at a periodicity of 130 nm were generated on Si(100) surfaces immersed in water using tightly focused 800 nm 12 fs pulsed 85 MHz laser light at subnanojoule pulse energies. At radiant exposure close to the ablation threshold rifts were typically 20-50 nm in width and 70 nm in depth running perpendicular to the laser polarization. On increase of the irradiance, the rifts broadened and formed periodic ripples, whereas at highest exposure, a random nanoporous surface topology emerged. Rift and ripple formation is explained by laser-induced standing surface plasma waves, which result in periodic variation of dissipation and ablation.

Sub-100 nm structuring of indium-tin-oxide thin films by sub-15 femtosecond pulsed near-infrared laser light.

In magnetron sputtered indium-tin-oxide thin films of varying oxygen content, nanostructures were formed using tightly focused high-repetition rate near-infrared sub-15 femtosecond pulsed laser light. At radiant exposure well beyond the ablation threshold, cuts of 280-350 nm in width were generated. Illumination close to the ablation threshold resulted in periodic cuts of typically 20 nm in width at periodicities between 50 nm and 180 nm, as well as single sub-20 nm cuts. Subthreshold exposure, in combination with hydrochloric acid etching, yielded nanowires of 50 nm minimum lateral dimensions.