Energetic Electron-Assisted Synthesis of Tailored Magnetite (Fe3O4) and Maghemite (γ-Fe2O3) Nanoparticles: Structure and Magnetic Properties.

Iron oxide nanoparticles with a mean size of approximately 5 nm were synthesized by irradiating micro-emulsions containing iron salts with energetic electrons. The properties of the nanoparticles were investigated using scanning electron microscopy, high-resolution transmission electron microscopy, selective area diffraction and vibrating sample magnetometry. It was found that formation of superparamagnetic nanoparticles begins at a dose of 50 kGy, though these particles show low crystallinity, and a higher portion is amorphous. With increasing doses, an increasing crystallinity and yield could be observed, which is reflected in an increasing saturation magnetization. The blocking temperature and effective anisotropy constant were determined via zero-field cooling and field cooling measurements. The particles tend to form clusters with a size of 34 nm to 73 nm. Magnetite/maghemite nanoparticles could be identified via selective area electron diffraction patterns. Additionally, goethite nanowires could be observed.

Sputtering of pure boron using a magnetron without a radio-frequency supply.

Boron at room temperature is insulating and therefore conventionally sputtered using radio-frequency power supplies including their power-matching networks. In this contribution, we show that through a suitable ignition assistance, via temporary application of a high voltage (∼600 V) to the substrate holder or auxiliary electrode, the magnetron discharge can be ignited using a conventional mid-frequency power supply without matching network. Once the discharge is ignited, the assisting voltage can be reduced to less than 50 V, and after the boron target surface is at elevated temperature, thereby exhibiting sufficient conductivity, the assisting voltage can be turned off. The deposition of boron and boron nitride films has been demonstrated with a deposition rate of approximately 400 nm/h for a power of 250 W.

Nearest-neighbour nanocrystal bonding dictates framework stability or collapse in colloidal nanocrystal frameworks.

Block copolymers serve as architecture-directing agents for the assembly of colloidal nanocrystals into a variety of mesoporous solids. Here we report the fundamental order-disorder transition in such assemblies, which yield, on one hand, ordered colloidal nanocrystals frameworks or, alternatively, disordered mesoporous nanocrystal films. Our determination of the order-disorder transition is based on extensive image analysis of films after thermal processing. The number of nearest-nanocrystal neighbours emerges as a critical parameter dictating assembly outcomes, which is in turn determined by the nanocrystal volume fraction (fNC). We also identify the minimum fNC needed to support the structure against collapse.

Tunable Bragg filters with a phase transition material defect layer.

We propose an all-solid-state tunable Bragg filter with a phase transition material as the defect layer. Bragg filters based on a vanadium dioxide defect layer sandwiched between silicon dioxide/titanium dioxide Bragg gratings are experimentally demonstrated. Temperature dependent reflection spectroscopy shows the dynamic tunability and hysteresis properties of the Bragg filter. Temperature dependent Raman spectroscopy reveals the connection between the tunability and the phase transition of the vanadium dioxide defect layer. This work paves a new avenue in tunable Bragg filter designs and promises more applications by combining phase transition materials and optical cavities.

Room Temperature Oxide Deposition Approach to Fully Transparent, All-Oxide Thin-Film Transistors.

A room temperature cathodic arc deposition technique is used to produce high-mobility ZnO thin films for low voltage thin-film transistors (TFTs) and digital logic inverters. All-oxide, fully transparent devices are fabricated on alkali-free glass and flexible polyimide foil, exhibiting high performance. This provides a practical materials platform for the low-temperature fabrication of all-oxide TFTs on virtually any substrate.

Element- and charge-state-resolved ion energies in the cathodic arc plasma from composite AlCr cathodes in argon, nitrogen and oxygen atmospheres.

The energy distribution functions of ions in the cathodic arc plasma using composite AlCr cathodes were measured as a function of the background gas pressure in the range 0.5 to 3.5 Pa for different cathode compositions and gas atmospheres. The most abundant aluminium ions were Al+ regardless of the background gas species, whereas Cr2+ ions were dominating in Ar and N2 and Cr+ in O2 atmospheres. The energy distributions of the aluminium and chromium ions typically consisted of a high-energy fraction due to acceleration in the expanding plasma plume from the cathode spot and thermalised ions that were subjected to collisions in the plasma cloud. The fraction of the latter increased with increasing background gas pressure. Atomic nitrogen and oxygen ions showed similar energy distributions as the aluminium and chromium ions, whereas the argon and molecular nitrogen and oxygen ions were formed at greater distance from the cathode spot and thus less subject to accelerating gradients. In addition to the positively charged metal and gas ions, negatively charged oxygen and oxygen-containing ions were observed in O2 atmosphere. The obtained results are intended to provide a comprehensive overview of the ion energies and charge states in the arc plasma of AlCr composite cathodes in different gas atmospheres as such plasmas are frequently used to deposit thin films and coatings.

A synchronized emissive probe for time-resolved plasma potential measurements of pulsed discharges.

A pulsed emissive probe technique is presented for measuring the plasma potential of pulsed plasma discharges. The technique provides time-resolved data and features minimal disturbance of the plasma achieved by alternating probe heating with the generation of plasma. Time resolution of about 20 ns is demonstrated for high power impulse magnetron sputtering (HIPIMS) plasma of niobium in argon. Spatial resolution of about 1 mm is achieved by using a miniature tungsten filament mounted on a precision translational stage. Repeated measurements for the same discharge conditions show that the standard deviation of the measurements is about 1-2 V, corresponding to 4%-8% of the maximum plasma potential relative to ground. The principle is demonstrated for measurements at a distance of 30 mm from the target, for different radial positions, at an argon pressure of 0.3 Pa, a cathode voltage of -420 V, and a discharge current of about 60 A in the steady-state phase of the HIPIMS pulse.

Dynamically modulating the surface plasmon resonance of doped semiconductor nanocrystals.

Localized surface plasmon absorption features arise at high doping levels in semiconductor nanocrystals, appearing in the near-infrared range. Here we show that the surface plasmons of tin-doped indium oxide nanocrystal films can be dynamically and reversibly tuned by postsynthetic electrochemical modulation of the electron concentration. Without ion intercalation and the associated material degradation, we induce a > 1200 nm shift in the plasmon wavelength and a factor of nearly three change in the carrier density.

A self-sputtering ion source: a new approach to quiescent metal ion beams.

A new metal ion source is presented based on sustained self-sputtering plasma in a magnetron discharge. Metals exhibiting high self-sputtering yield such as Cu, Ag, Zn, and Bi can be used in a high-power impulse magnetron sputtering discharge such that the plasma almost exclusively contains singly charged metal ions of the target material. The plasma and extracted ion beam are quiescent. The ion beams consist mostly of singly charged ions with a space-charge limited current density which reached about 10 mA/cm(2) at an extraction voltage of 45 kV and a first gap spacing of 12 mm.

Self-sputtering far above the runaway threshold: an extraordinary metal-ion generator.

When self-sputtering is driven far above the runaway threshold voltage, energetic electrons are made available to produce "excess plasma" far from the magnetron target. Ionization balance considerations show that the secondary electrons deliver the necessary energy to the "remote" zone. Thereby, such a system can be an extraordinarily prolific generator of usable metal ions. Contrary to other known sources, the ion current to a substrate can exceed the discharge current. For gasless self-sputtering of copper, the usable ion current scales exponentially with the discharge voltage.

Filtered cathodic arc deposition with ion-species-selective bias.

A dual-cathode arc plasma source was combined with a computer-controlled bias amplifier to synchronize substrate bias with the pulsed production of plasma. In this way, bias can be applied in a material-selective way. The principle has been applied to the synthesis of metal-doped diamondlike carbon films, where the bias was applied and adjusted when the carbon plasma was condensing and the substrate was at ground when the metal was incorporated. In doing so, excessive sputtering by energetic metal ions can be avoided while the sp(3)sp(2) ratio can be adjusted. It is shown that the resistivity of the film can be tuned by this species-selective bias; Raman spectroscopy was used to confirm expected changes of the amorphous ta-C:Mo films. The species-selective bias principle could be extended to multiple material plasma sources and complex materials.

Low-energy linear oxygen plasma source.

A new version of a constricted plasma source is described, characterized by all metal-ceramic construction, a linear slit exit of 180 mm length, and cw operation (typically 50 kHz) at an average power of 1.5 kW. The plasma source is here operated with oxygen gas, producing streaming plasma that contains mainly positive molecular and atomic ions, and to a much lesser degree, negative ions. The maximum total ion current obtained was about 0.5 A. The fraction of atomic ions reached more than 10% of all ions when the flow rate was less then 10 SCCM O(2), corresponding to a chamber pressure of about 0.5 Pa for the selected pumping speed. The energy distribution functions of the different ion species were measured with a combined mass spectrometer and energy analyzer. The time-averaged distribution functions were broad and ranged from about 30 to 90 eV at 200 kHz and higher frequencies, while they were only several eV broad at 50 kHz and lower frequencies, with the maximum located at about 40 eV for the grounded anode case. This maximum was shifted down to about 7 eV when the anode was floating, indicating the important role of the plasma potential for the ion energy for a given substrate potential. The source could be scaled to greater length and may be useful for functionalization of surfaces and plasma-assisted deposition of compound films.