Study of waveguide background at visible wavelengths for on-chip nanoscopy.

On-chip super-resolution optical microscopy is an emerging field relying on waveguide excitation with visible light. Here, we investigate two commonly used high-refractive index waveguide platforms, tantalum pentoxide (Ta2O5) and silicon nitride (Si3N4), with respect to their background with excitation in the range 488-640 nm. The background strength from these waveguides were estimated by imaging fluorescent beads. The spectral dependence of the background from these waveguide platforms was also measured. For 640 nm wavelength excitation both the materials had a weak background, but the background increases progressively for shorter wavelengths for Si3N4. We further explored the effect of the waveguide background on localization precision of single molecule localization for direct stochastic optical reconstruction microscopy (dSTORM). An increase in background for Si3N4 at 488 nm is shown to reduce the localization precision and thus the resolution of the reconstructed images. The localization precision at 640nm was very similar for both the materials. Thus, for shorter wavelength applications Ta2O5 is preferable. Reducing the background from Si3N4 at shorter wavelengths via improved fabrication will be worth pursuing.

Metasurface Fabrication by Cryogenic and Bosch Deep Reactive Ion Etching.

The research field of metasurfaces has attracted considerable attention in recent years due to its high potential to achieve flat, ultrathin optical devices of high performance. Metasurfaces, consisting of artificial patterns of subwavelength dimensions, often require fabrication techniques with high aspect ratios (HARs). Bosch and Cryogenic methods are the best etching candidates of industrial relevance towards the fabrication of these nanostructures. In this paper, we present the fabrication of Silicon (Si) metalenses by the UV-Nanoimprint Lithography method and cryogenic Deep Reactive Ion Etching (DRIE) process and compare the results with the same structures manufactured by Bosch DRIE both in terms of technological achievements and lens efficiencies. The Cryo- and Bosch-etched lenses attain efficiencies of around 39% at wavelength λ = 1.50 µm and λ = 1.45 µm against a theoretical level of around 61% (for Si pillars on a Si substrate), respectively, and process modifications are suggested towards raising the efficiencies further. Our results indicate that some sidewall surface roughness of the Bosch DRIE is acceptable in metalense fabrication, as even significant sidewall surface roughness in a non-optimized Bosch process yields reasonable efficiency levels.

Towards high-throughput large-area metalens fabrication using UV-nanoimprint lithography and Bosch deep reactive ion etching.

We demonstrate the fabrication of diffraction-limited dielectric metasurface lenses for NIR by the use of standard industrial high-throughput silicon processing techniques: UV nano imprint lithography (UV-NIL) combined with continuous reactive ion etching (RIE) and pulsed Bosch deep reactive ion etching (DRIE). As the research field of metasurfaces moves towards applications, these techniques are relevant as potential replacements of commonly used cost-intensive fabrication methods utilizing electron beam ithography. We show that washboard-type sidewall surface roughness arising from the Bosch DRIE process can be compensated for in the design of the metasurface, without deteriorating lens quality. Particular attention is given to fabrication challenges that must be overcome towards high-throughput production of relevance to commercial applications. Lens efficiencies are measured to be 25.5% and 29.2% at wavelengths λ = 1.55µm and λ = 1.31µm, respectively. A number of routes towards process optimization are proposed in relation to encountered challenges.

Low-loss ultrasound transmission through glass assisted by resonance.

We have investigated transmission of ultrasound signals from a speaker in air through a 400 µm thick borosilicate glass plate, similar to those found in consumer electronics products such as mobile phones and tablets. In order to enhance transmission, we took advantage of resonances in the glass plate and a cavity, which is placed between the glass and the microphone. The results show that it is possible to achieve transmission of a signal with bandwidth of approximately 5 kHz with less than -10 dB attenuation, and only -2 dB attenuation at the resonance peak frequency. With more optimized assembly the attenuation can be further reduced. Finite element simulations and analytical considerations show that there are two main resonance peaks, attributed to the glass resonance and cavity resonance, respectively. The geometry can be tuned to exploit the synergy of these two resonances in order to tailor the peak frequency, the bandwidth and to optimize transmission.

Wood's anomalies and spectral uniformity of focusing diffractive optical elements.

We report on simulations and measurements of focusing diffractive optical elements, fabricated as two-level binary optics. The diffractive optical elements are designed to separate and focus four specific wavelengths in the infrared. The simulations are based on a local linear grating model, and predict anomalies similar to Wood's anomalies known from grating diffraction theory. The anomalies are also seen in the measurements, and are excited at the DOE locations predicted by the simulations. The given examples illustrate the usefulness of the model for evaluation of DOE designs. We also present a comparison of the response and spectral uniformity between two different versions of the four-wavelength diffractive optical elements. In the first version, the optical functions for all the four wavelengths are incorporated into the same surface pattern, covering the whole patterned area. In the second version the pattern f each wavelength is kept separate, and cover one fourth of the area, forming a mosaic of the four individual patterns.

Spectral uniformity of two- and four-level diffractive optical elements for spectroscopy.

We present simulations and characterization of gold coated diffractive optical elements (DOEs) that have been designed and fabricated in silicon for an industrial application of near-infrared spectroscopy. The DOE design is focusing and reflecting, and two-level and four-level binary designs were studied. Our application requires the spectral response of the DOE to be uniform over the DOE surface. Thus the variation in the spectral response over the surface was measured, and studied in simulations. Measurements as well as simulations show that the uniformity of the spectral response is much better for the four-level design than for the two-level design. Finally, simulations and measurements show that the four-level design meets the requirements of spectral uniformity from the industrial application, whereas the simulations show that the physical properties of diffraction gratings in general make the simpler tw level design unsuitable.