ABSTRACT
PURPOSE: The aim of this study was to evaluate the influence of different density and amplitude of electric current on the percentage of bone-implant contact (BIC) using the finite element method. MATERIALS AND METHODS: Numerical models were performed on commercially pure titanium grade IV implants connected to a 1.5 V battery with an electrical resistance (R) at 150 kΩ on 10 µA or at 75 kΩ on 20 µA. The percentage of simulated BIC was analysed by varying the electric current from 1 up to 60 µA. The variation of electric current application was simulated for coronal and apical peri-implant regions. RESULTS: The findings showed that a direct and constant electric current source below 10 µA does not provide a proper current density for osseointegration (BIC < 55%). Electric current sources ranging from 10 to 20 µA resulted in an increase in BIC above 60% while BIC reached 90% on 30 to 40 µA. Also, the application of the current source on 20 µA at the apical peri-implant region resulted in a high BIC percentage at around 86.1%. CONCLUSIONS: The location and intensity of the electrical current source can increase the resultant electrical current density at the implant-bone interface and enhance the bone healing process. Although the model is a simplified version of the biological process in the bone-implant interface, such findings can predict a magnitude of electrical current density required to stimulate osseointegration.
