Nanotribological behavior of deep cryogenically treated martensitic stainless steel.

Cryogenic treatments are increasingly used to improve the wear resistance of various steel alloys by means of transformation of retained austenite, deformation of virgin martensite and carbide refinement. In this work the nanotribological behavior and mechanical properties at the nano-scale of cryogenically and conventionally treated AISI 420 martensitic stainless steel were evaluated. Conventionally treated specimens were subjected to quenching and annealing, while the deep cryogenically treated samples were quenched, soaked in liquid nitrogen for 2 h and annealed. The elastic-plastic parameters of the materials were assessed by nanoindentation tests under displacement control, while the friction behavior and wear rate were evaluated by a nanoscratch testing methodology that it is used for the first time in steels. It was found that cryogenic treatments increased both hardness and elastic limit of a low-carbon martensitic stainless steel, while its tribological performance was enhanced marginally.

Synthesis and properties of CS x F y thin films deposited by reactive magnetron sputtering in an Ar/SF6 discharge.

A theoretical and experimental study on the growth and properties of a ternary carbon-based material, CS x F y , synthesized from SF6 and C as primary precursors is reported. The synthetic growth concept was applied to model the possible species resulting from the fragmentation of SF6 molecules and the recombination of S-F fragments with atomic C. The possible species were further evaluated for their contribution to the film growth. Corresponding solid CS x F y thin films were deposited by reactive direct current magnetron sputtering from a C target in a mixed Ar/SF6 discharge with different SF6 partial pressures ([Formula: see text]). Properties of the films were determined by x-ray photoelectron spectroscopy, x-ray reflectivity, and nanoindentation. A reduced mass density in the CS x F y films is predicted due to incorporation of precursor species with a more pronounced steric effect, which also agrees with the low density values observed for the films. Increased [Formula: see text] leads to decreasing deposition rate and increasing density, as explained by enhanced fluorination and etching on the deposited surface by a larger concentration of F/F2 species during the growth, as supported by an increment of the F relative content in the films. Mechanical properties indicating superelasticity were obtained from the film with lowest F content, implying a fullerene-like structure in CS x F y compounds.

Nanoscale piezoelectric response of ZnO nanowires measured using a nanoindentation technique.

We report the piezoelectric properties of ZnO nanowires (NWs) obtained by using a nanoindenter with a conductive boron-doped diamond tip. The direct piezoelectric effect was measured by performing nanoindentations under load control, and the generated piezoelectric voltage was characterized as a function of the applied loads in the range 0.2-6 mN. The converse piezoelectric effect was measured by applying a DC voltage to the sample while there was a low applied force to allow the tip being always in physical contact with the NWs. Vertically aligned ZnO NWs were grown on inexpensive, flexible, and disposable paper substrates using a template-free low temperature aqueous chemical growth method. When using the nanoindenter to measure the direct piezoelectric effect, piezopotential values of up to 26 mV were generated. Corresponding measurement of the converse piezoelectric effect gave an effective piezoelectric coefficient d33(eff) of ∼9.2 pm V(-1). The ZnO NWs were also characterized using scanning electron microscopy, X-ray diffraction, and high-resolution transmission electron microscopy. The new nanoindentation approach provides a straightforward method to characterize piezoelectric material deposited on flexible and disposable substrates for the next generation of nanodevices.

Nanoscale elastic modulus of single horizontal ZnO nanorod using nanoindentation experiment.

We measure the elastic modulus of a single horizontal ZnO nanorod [NR] grown by a low-temperature hydrothermal chemical process on silicon substrates by performing room-temperature, direct load-controlled nanoindentation measurements. The configuration of the experiment for the single ZnO NR was achieved using a focused ion beam/scanning electron microscope dual-beam instrument. The single ZnO NR was positioned horizontally over a hole on a silicon wafer using a nanomanipulator, and both ends were bonded with platinum, defining a three-point bending configuration. The elastic modulus of the ZnO NR, extracted from the unloading curve using the well-known Oliver-Pharr method, resulted in a value of approximately 800 GPa. Also, we discuss the NR creep mechanism observed under indentation. The mechanical behavior reported in this paper will be a useful reference for the design and applications of future nanodevices.

Oxidation of fluorinated amorphous carbon (a-CF(x)) films.

Amorphous fluorinated carbon (a-CF(x)) films have a variety of potential technological applications. In most such applications these films are exposed to air and undergo partial surface oxidation. X-ray photoemission spectroscopy has been used to study the oxidation of fresh a-CF(x) films deposited by magnetron sputtering. The oxygen sticking coefficient measured by exposure to low pressures (<10(-3) Torr) of oxygen at room temperature is on the order of S approximately 10(-6), indicating that the surfaces of these films are relatively inert to oxidation when compared with most metals. The X-ray photoemission spectra indicate that the initial stages of oxygen exposure (<10(7) langmuirs) result in the preferential oxidation of the carbon atoms with zero or one fluorine atom, perhaps because these carbon atoms are more likely to be found in configurations with unsaturated double bonds and radicals than carbon atoms with two or three fluorine atoms. Exposure of the a-CF(x) film to atmospheric pressures of air (effective exposure of 10(12) langmuirs to O(2)) results in lower levels of oxygen uptake than the low pressure exposures (<10(7) langmuirs). It is suggested that this is the result of oxidative etching of the most reactive carbon atoms, leaving a relatively inert surface. Finally, low pressure exposures to air result in the adsorption of both nitrogen and oxygen onto the surface. Some of the nitrogen adsorbed on the surface at low pressures is in a reversibly adsorbed state in the sense that subsequent exposure to low pressures of O(2) results in the displacement of nitrogen by oxygen. Similarly, when an a-CF(x) film oxidized in pure O(2) is exposed to low pressures of air, some of the adsorbed oxygen is displaced by nitrogen. It is suggested that these forms of nitrogen and oxygen are bound to free radical sites in the film.

Oxidation kinetics of hydrogenated amorphous carbon (a-CH(x)) overcoats for magnetic data storage media.

The oxidation kinetics of a-CHx overcoats during exposure to oxygen and water vapor have been measured using X-ray photoemission spectroscopy (XPS) in an apparatus that allows oxidation and analysis of freshly deposited a-CHx overcoats without prior exposure of the overcoats to air. The uptake of oxygen on the surfaces of the a-CHx overcoats has been measured at O2 and H2O pressures in the range 10(-7)-10(-3) Torr at room temperature. The uptake of oxygen during O2 exposures on the order of 10(7) Langmuirs leads to saturation of the a-CHx overcoat surfaces at oxidation levels on the order of 20%. This indicates that the surfaces of a-CHx overcoats are relatively inert to oxidation in the sense that the dissociative sticking coefficient of O2 is approximately 10(-6). Oxygen uptake during exposure to H2O vapor is similar to the uptake during exposure to O2 gas. Although the surfaces of the a-CHx overcoats are quite inhomogeneous, it has been possible to model the uptake of oxygen on their surfaces using a fairly simple Langmuir-Hinshelwood mechanism. Interestingly, the saturation coverage of oxygen during exposure to air at atmospheric pressure is approximately 6%, significantly lower than that obtained during low-pressure exposure to O2 gas or H2O vapor.

Adsorption of fluorinated ethers and alcohols on fresh and oxidized carbon overcoats for magnetic data storage.

Temperature programmed desorption has been used to study the desorption kinetics and desorption energies of perfluorodiethylether, (CF3CF2)2O, and 2,2,2-trifluoroethanol, CF3CH2OH, adsorbed on fresh and oxidized hydrogenated amorphous carbon (a-CHx) films. (CF3CF2)2O and CF3CH2OH serve as models for the ether backbone and hydroxyl end-groups of Fomblin Zdol, the lubricant most commonly used to lubricate the surfaces of amorphous carbon overcoats on magnetic data storage hard disks. Our measurements clearly reveal, for the first time, the effects of surface oxidation on the adsorption of fluorocarbon lubricants such as Fomblin Zdol on a-CHx films. Oxidation of the a-CHx surface increases the desorption energy of CF3CH2OH but has no observable impact on the desorption energy of (CF3CF2)2O. These results support the suggestion that the alcohols interact with the surface via hydrogen bonding. From a practical perspective, these results imply that the oxidation of the fresh a-CHx film may serve as a means to control or tailor the a-CHx surface to optimize the properties of the lubricant-overcoat interface in hard disks.