ABSTRACT
The development of the optical bio-chemical sensing technology is an extremely important scientific and technological issue for diagnosis and monitoring of diseases, control of industrial processes, environmental detection of air and water pollutants. Owing to their distinctive features, chalcogenide amorphous thin films represent a keystone in the manufacture of middle infrared integrated optical devices for a sensitive detection of biological or environmental variations. Since the chalcogenide thin films characteristics, i.e. stoichiometric conformity, structure, roughness or optical properties can be affected by the growth process, the choice and control of the deposition method is crucial. An approach based on the experimental design is undoubtedly a way to be explored allowing fast optimization of chalcogenide film deposition by means of radio frequency sputtering process. Argon (Ar) pressure, working power and deposition time were selected as potentially the most influential factors among all possible. The experimental design analysis confirms the great influence of the Ar pressure on studied responses: chemical composition, refractive index in near-IR (1.55 µm) and middle infrared (6.3 and 7.7 µm), band-gap energy, deposition rate and surface roughness. Depending on the intended application and therefore desired thin film characteristics, mappings of the experimental design meaningfully help to select suitable deposition parameters.
ABSTRACT
Plasma processing is used to fabricate super hydrophilic or super hydrophobic polymeric surfaces by means of O2 plasma etching of two organic polymers, namely, poly(methyl methacrylate) (PMMA) and poly(ether ether ketone) (PEEK); a C4F8 plasma deposition follows O2 plasma etching, if surface hydrophobization is desired. We demonstrate high aspect ratio pillars with height ranging from 16 nm to several micrometers depending on the processing time, and contact angle (CA) close to 0 degrees after O2-plasma treatment or CA of 153 degrees (with CA hysteresis lower than 5 degrees) after fluorocarbon deposition. Super hydrophobic surfaces are robust and stable in time; in addition, aging of super hydrophilic surfaces is significantly retarded because of the beneficial effect of the nanotextured topography. The mechanisms responsible for the plasma-induced PMMA and PEEK surface nanotexturing are unveiled through intelligent experiments involving intentional modification of the reactor wall material and X-ray photoelectron spectroscopy, which is also used to study the surface chemical modification in the plasma. We prove that control of plasma nanotexture can be achieved by carefully choosing the reactor wall material.
