Diffractive phase-shift lithography photomask operating in proximity printing mode.

A phase shift proximity printing lithographic mask is designed, manufactured and tested. Its design is based on a Fresnel computer-generated hologram, employing the scalar diffraction theory. The obtained amplitude and phase distributions were mapped into discrete levels. In addition, a coding scheme using sub-cells structure was employed in order to increase the number of discrete levels, thus increasing the degree of freedom in the resulting mask. The mask is fabricated on a fused silica substrate and an amorphous hydrogenated carbon (a:C-H) thin film which act as amplitude modulation agent. The lithographic image is projected onto a resist coated silicon wafer, placed at a distance of 50 microm behind the mask. The results show a improvement of the achieved resolution--linewidth as good as 1.5 microm--what is impossible to obtain with traditional binary masks in proximity printing mode. Such achieved dimensions can be used in the fabrication of MEMS and MOEMS devices. These results are obtained with a UV laser but also with a small arc lamp light source exploring the partial coherence of this source.

Holographic technique for measurement of the kinetic constant and optical modulation of photosensitive materials.

We use a holographic technique to measure simultaneously and separately the temporal evolution of the refractive-index and the absorption coefficient modulations induced by light in a photosensitive material. The technique is phase sensitive, allowing separation of the signals from the phase and from the amplitude grating. The refractive-index and the absorption coefficient modulations as well as the kinetic constant of the photoreaction in the positive photoresist SC 1827 were measured at three different wavelengths. The results were compared with independent measurements, performed under homogeneous exposition. The good accord demonstrates the applicability of the technique to study photosensitive materials.

Bulk photochromism in a tungstate-phosphate glass: a new optical memory material?

In this work, we present a new photochromic tungstate based glass which have both absorption coefficient and refractive index modified under laser exposure. The photosensitive effect is superficial under ultraviolet (UV) irradiation but occurs in the entire volume of the glass under visible irradiation. The effect can be obtained in any specific point inside the volume using an infrared femtosecond laser. In addition, the photosensitive phenomenon can be erased by specific heat treatment. This glass can be useful to substitute actual data storage supports and is a promising material for 3-dimensional (3D) and holographic optical storage.

Phase constraint for the waves diffracted by lossless symmetrical gratings at Littrow mount.

The energy conservation of grating diffraction is analyzed in a particular condition of incidence in which two incident waves reach a symmetrical grating from the two sides of the grating normal at the first-order Littrow mounting. In such a situation the incident waves generate an interference pattern with the same period as the grating. Thus in each direction of diffraction, interference occurs between two consecutive diffractive orders of the symmetrical incident waves. By applying only energy conservation and the geometrical symmetry of the grating profile to this problem it is possible to establish a general constraint for the phases and amplitudes of the diffracted orders of the same incident wave. Experimental and theoretical results are presented confirming the obtained relations.

Study of the injection molding of a polarizing beam splitter.

We describe the replication of a relief grating that behaves like a polarizing beam splitter by injection molding. Measurements of the grating master, nickel shim, and replica, performed by atomic force microscopy, allow establishing a limit for the injection molding technique (currently used in CD fabrication) to aspect ratios of approximately 0.15. Although this limit strongly reduces the diffraction efficiency of the elements as well as their polarizing properties, extinction ratios of approximately 10:1 were measured for the replicas in a large range of wavelengths.