1.
J Nanosci Nanotechnol
; 6(7): 2175-81, 2006 Jul.
Article
in English
| MEDLINE
| ID: mdl-17025145
ABSTRACT
Textured alumina films have been used to fabricate nanoscale pores in Si3N4 membranes. A few nanometer-thick alumina layer was used as a masking material for nanopore fabrication, and the pattern was transferred into a 100-nm thick, 200 microm x 200 microm Si3N4 membrane by reactive ion etching (RIE). The nanopores were found to be concentrated in a approximately 150-microm diameter region at the center of the membrane.