ABSTRACT
In the present work, optically thick nanostructured titanium (Ti) films of thickness ranging from â¼100 to 900 nm were deposited on a glass substrate by DC magnetron sputtering at room temperature. Microstructural and surface properties of the samples were studied by x-ray diffraction and x-ray photoelectron spectroscopy (XPS). The morphological results revealed a systematic normal grain growth mechanism with increasing thickness analyzed by a scanning electron microscope. The influence of thickness on film surface roughness has been investigated by atomic force microscopy (AFM). The optical dispersion behavior was examined by spectroscopic ellipsometry (SE) over the long wavelength range of 246-1688 nm. The experimentally observed SE parameters were theoretically fitted with Drude-Lorentz and Bruggeman effective medium approximation theory. The surface properties of the Ti film measured by XPS and AFM were further accounted for in the optical model to determine optical constants (n and k) and the obtained results are expected to be the best available for bulk Ti metal.
