ABSTRACT
The coupling between the quantum dots (QDs) and silicon-based microdisk resonator facilitates enhancing the light-matter interaction for the novel silicon-based light source. However, the typical circular microdisks embedded with Ge QDs still have several issues, such as wide spectral bandwidth, difficult mode selection, and low waveguide coupling efficiency. Here, by a promising structural modification based on the mature nanosphere lithography (NSL), we fabricate a large area hexagonal microdisk array embedded with Ge QDs in order to enhance the near-infrared light emissions by a desired whispering gallery modes (WGMs). By comparing circular microdisks with comparable sizes, we found the unique photoluminescence enhancement effect of hexagonal microdisks for certain modes. We have confirmed the WGMs which are supported by the microdisks and the well-correlated polarized modes for each resonant peak observed in experiments through the Finite Difference Time Domain (FDTD) simulation. Furthermore, the unique enhancement of the TE5,1 mode in the hexagonal microdisk is comparatively analyzed through the simulation of optical field distribution in the cavity. The larger enhanced region of the optical field contains more effectively coupled QDs, which significantly enhances the PL intensity of Ge QDs. Our findings offer a promising strategy toward a distinctive optical cavity that enables promising mode manipulation and enhancement effects for large-scale, cost-effective photonic devices.
ABSTRACT
In this work, the wavelength selection characteristics of metal gratings on Si-based blocked-impurity-band (BIB) detectors in the terahertz band were studied by performing experiments and a finite difference time domain (FDTD) simulation. The transmission spectra of metal gratings with different periods on 130 µm intrinsic Si substrates were measured. When the metal grating period increased from 16 to 20 to 32 µm, the peak position of the spectrum moved from 21.71 to 24.50 to 36.59 µm, which is in good agreement with the FDTD simulation results. The structure with the period of 32 µm shows the best wavelength selective transmission characteristics. Then, the bare Si-based BIB devices and metal grating/Si-based BIB hybrid devices with different thicknesses of blocking layers of 2 and 5 µm were fabricated. By covering different periods of metal gratings for the devices with a thicker blocking layer of 2 µm, we obtained more effective wavelength selection characteristics and stronger response spectra enhancement ratios that were about 1.3, 2.4, or 1.9 times. This was mainly due to the localized optical field enhancement effect of the plasmons resonance in metal gratings, which decays exponentially in a vertical direction. Our results demonstrate a new approach for the Si-based BIB detector to realize multiband selective detection applications.
ABSTRACT
To investigate the effects of the pixel sizes and the electrode structures on the performance of Ge-based terahertz (THz) photoconductive detectors, vertical structure Ge:Ga detectors with different structure parameters were fabricated. The characteristics of the detectors were investigated at 4.2 K, including the spectral response, blackbody response (Rbb), dark current density-voltage characters, and noise equivalent power (NEP). The detector with the pixel radius of 400 µm and the top electrode of the ring structure showed the best performance. The spectral response band of this detector was about 20-180 µm. The Rbb of this detector reached as high as 0.92 A/W, and the NEP reached 5.4 × 10-13 W/Hz at 0.5 V. Compared with the detector with a pixel radius of 1000 µm and the top electrode of the spot structure, the Rbb increased nearly six times, and the NEP decreased nearly 12 times. This is due to the fact that the optimized parameters increased the equivalent electric field of the detector. This work provides a route for future research into large-scale array Ge-based THz detectors.
ABSTRACT
Here, SiGeSn nanostructures were grown via molecular beam epitaxy on a Si (111) substrate with the assistance of Sn droplets. Owing to the thermal effect and the compressive strain induced by a lattice mismatch, Si and Sn atoms were successfully incorporated into the Ge matrix during the Sn-guided Ge deposition process. A low growth temperature of 350 °C produced a variety of SiGeSn nanostructures of different sizes, attributed to the variation of the initial Sn droplet size. Using energy-dispersive X-ray spectroscopy, the Sn, Si and Ge contents of a defect-free SiGeSn nanoisland were approximately determined to be 0.05, 0.09 and 0.86, respectively. Furthermore, as the growth temperature increased past 600 °C, the growth direction of the nanostructure was changed thermally from out-of-plane to in-plane. Meanwhile, the stacked SiGeSn nanowires grown along the ã112ã direction remained defect-free, though some threading dislocations were observed in the smooth SiGeSn nanowires along the ã110ã direction. These results offer a novel method to grow Si-based SiGeSn nanostructures while possessing important implications for fabricating further optoelectronic devices.
ABSTRACT
In this work, the photoelectric response properties of the graphene/GeSi QDs hybrid structure were demonstrated by measuring the I-V curve, and the incident photon-to-current conversion efficiency (IPCE). The maximal on-off ratio of the current value reaches 1500 at 10 K, due to the competition between the carrier freeze-out effect and the recombination center effect. The IPCE of the hybrid structure under different incident light indicated that the photoelectric response of hybrid structure is most sensitive to the ultraviolet light (325 nm), which is attributed to the enhanced ultraviolet absorption of graphene surface plasmon in the hybrid structure. Hence, our results represent that the graphene/GeSi QDs hybrid structure has potential application as a novel ultraviolet photoelectric device.
