3D printing of silica glass through a multiphoton polymerization process.

We introduce a laser-based process relying on multiphoton-induced polymerization to produce complex three-dimensional (3D) glass parts. A focused, intense laser beam is used to polymerize a transparent resin, loaded with additives and silica nanoparticles, at the wavelength of the laser beam through nonlinear absorption processes. The object is created directly in the volume, overcoming the limitation of the layer-by-layer process. The process enables the production of silica parts with consecutive debinding and sintering processes. With bulk silica density and a resolution that depends on the laser spot size, 3D objects of centimetric dimensions are obtained.

Laser-induced birefringence measurements by quantitative polarized-phase microscopy.

A technique that provides quantitative and spatially resolved retardance measurement is studied for application to laser-induced modification in transparent materials. The method is based on the measurement of optical path differences between two wavefronts carrying different polarizations, measured by a wavefront sensor placed in the image plane of a microscope. We have applied the technique to the investigation of stress distribution induced by CO2 laser processing of fused silica samples. By comparing experiments to the results of thermomechanical simulations we demonstrate quantitative agreement between measurements and simulations of optical retardance. The technique provides an efficient and simple way to measure retardance of less than 1 nm with a diffraction-limited spatial resolution in transparent samples, and coupled to thermomechanical simulations it gives access to birefringence distribution in the sample.

Quantitative phase imaging applied to laser damage detection and analysis.

We investigate phase imaging as a measurement method for laser damage detection and analysis of laser-induced modification of optical materials. Experiments have been conducted with a wavefront sensor based on lateral shearing interferometry associated with a high-magnification optical microscope. The system has been used for the in-line observation of optical thin films and bulk samples, laser irradiated in two different conditions: 500 fs pulses at 343 and 1030 nm, and millisecond to second irradiation with a CO2 laser at 10.6 µm. We investigate the measurement of the laser-induced damage threshold of optical material by detection and phase changes and show that the technique realizes high sensitivity with different optical path measurements lower than 1 nm. Additionally, the quantitative information on the refractive index or surface modification of the samples under test that is provided by the system has been compared to classical metrology instruments used for laser damage or laser ablation characterization (an atomic force microscope, a differential interference contrast microscope, and an optical surface profiler). An accurate in-line measurement of the morphology of laser-ablated sites, from few nanometers to hundred microns in depth, is shown.