ABSTRACT
Before being used in an extreme-ultraviolet (EUV) scanner, photoresists must first be evaluated for sensitivity and tested to ensure that they will not contaminate the scanner optics. The new NIST facility described here provides data on the contamination potential of the outgas products of a candidate resist by simultaneously irradiating a multilayer optic and a nearby resist-coated wafer with EUV radiation. The facility can also be used without changing its configuration to provide accurate resist dose-to-clear measurements. Detailed, real-time information on the rate of contamination growth is given by a unique, in situ imaging ellipsometer. We will describe the optical layout, mechanical design, and capabilities of the beamline, finally presenting experimental examples of its capabilities.
ABSTRACT
The electron stimulated reactions of methyl iodide (MeI) adsorbed on and suspended within amorphous solid water (ice) were studied using a combination of postirradiation temperature programmed desorption and reflection absorption infrared spectroscopy. For MeI adsorbed on top of amorphous solid water (ice), electron beam irradiation is responsible for both structural and chemical transformations within the overlayer. Electron stimulated reactions of MeI result principally in the formation of methyl radicals and solvated iodide anions. The cross section for electron stimulated decomposition of MeI is comparable to the gas phase value and is only weakly dependent upon the local environment. For both adsorbed MeI and suspended MeI, reactions of methyl radicals within MeI clusters lead to the formation of ethane, ethyl iodide, and diiodomethane. In contrast, reactions between the products of methyl iodide and water dissociation are responsible for the formation of methanol and carbon dioxide. Methane, formed as a result of reactions between methyl radicals and either parent MeI molecules or hydrogen atoms, is also observed. The product distribution is found to depend on the film's initial chemical composition as well as the electron fluence. Results from this study highlight the similarities in the carbon-containing products formed when monohalomethanes coadsorbed with amorphous solid water are irradiated by either electrons or photons.
ABSTRACT
The kinetics of decomposition and subsequent chemistry of adsorbed CF(2)Cl(2), activated by low-energy electron irradiation, have been examined and compared with CCl(4). These molecules have been adsorbed alone and coadsorbed with water ice films of different thicknesses on metal surfaces (Ru; Au) at low temperatures (25 K; 100 K). The studies have been performed with temperature programmed desorption (TPD), reflection absorption infrared spectroscopy (RAIRS), and x-ray photoelectron spectroscopy (XPS). TPD data reveal the efficient decomposition of both halocarbon molecules under electron bombardment, which proceeds via dissociative electron attachment (DEA) of low-energy secondary electrons. The rates of CF(2)Cl(2) and CCl(4) dissociation increase in an H(2)O (D(2)O) environment (2-3x), but the increase is smaller than that reported in recent literature. The highest initial cross sections for halocarbon decomposition coadsorbed with H(2)O, using 180 eV incident electrons, are measured (using TPD) to be 1.0+/-0.2 x 10(-15) cm(2) for CF(2)Cl(2) and 2.5+/-0.2 x 10(-15) cm(2) for CCl(4). RAIRS and XPS studies confirm the decomposition of halocarbon molecules codeposited with water molecules, and provide insights into the irradiation products. Electron-induced generation of Cl(-) and F(-) anions in the halocarbon/water films and production of H(3)O(+), CO(2), and intermediate compounds COF(2) (for CF(2)Cl(2)) and COCl(2), C(2)Cl(4) (for CCl(4)) under electron irradiation have been detected using XPS, TPD, and RAIRS. The products and the decomposition kinetics are similar to those observed in our recent experiments involving x-ray photons as the source of ionizing irradiation.