ABSTRACT
The optimum femtosecond laser direct writing of Bragg gratings on silica optical waveguides has been investigated. The silica waveguide has a 6.5 × 6.5 µm2 cross-sectional profile with a 20-µm-thick silicon dioxide cladding layer. Compared with conventional grating inscribed on fiber platforms, the silica planar waveguide circuit can realize a stable performance as well as a high-efficiency coupling with the fiber. A thin waveguide cladding layer also facilitates laser focusing with an improved spherical aberration. Different from the circular fiber core matching with the Gaussian beam profile, a 1030-nm, 400-fs, and 190-nJ laser is optimized to focus on the top surface of the square silica waveguide, and the 3rd-order Bragg gratings are inscribed successfully. A 1.5-mm long uniform Bragg gratings structure with a reflectivity of 90% at a 1548.36-nm wavelength can be obtained. Cascaded Bragg gratings with different periods are also inscribed in the planar waveguide. Different reflection wavelengths can be realized, which shows great potential for wavelength multiplexing-related applications such as optical communications or sensing.
ABSTRACT
Atomic scale control of the thickness of thin film makes atomic layer deposition highly advantageous in the preparation of high quality super-lattices. However, precisely controlling the film chemical stoichiometry is very challenging. In this study, we deposited SiOx film with different stoichiometry by plasma enhanced atomic layer deposition. After reviewing various deposition parameters like temperature, precursor pulse time, and gas flow, the silicon dioxides of stoichiometric (SiO2) and non-stoichiometric (SiO1.8 and SiO1.6) were successfully fabricated. X-ray photo-electron spectroscopy was first employed to analyze the element content and chemical bonding energy of these films. Then the morphology, structure, composition, and optical characteristics of SiOx film were systematically studied through atomic force microscope, transmission electron microscopy, X-ray reflection, and spectroscopic ellipsometry. The experimental results indicate that both the mass density and refractive index of SiO1.8 and SiO1.6 are less than SiO2 film. The energy band-gap is approved by spectroscopic ellipsometry data and X-ray photo-electron spectroscopy O 1s analysis. The results demonstrate that the energy band-gap decreases as the oxygen concentration decreases in SiOx film. After we obtained the Si-rich silicon oxide film deposition, the SiO1.6/SiO2 super-lattices was fabricated and its photoluminescence (PL) property was characterized by PL spectra. The weak PL intensity gives us greater awareness that more research is needed in order to decrease the x of SiOx film to a larger extent through further optimizing plasma-enhanced atomic layer deposition processes, and hence improve the photoluminescence properties of SiOx/SiO2 super-lattices.
