ABSTRACT
Resist-based patterning solutions play essential roles in modern micro- and nanoscale science and technology. The commonly used 'resist' patterning strategy depends on selective-area scission or cross-linking of resist molecules under the action of an energy beam. In this work, we propose and demonstrate a different resist-patterning strategy, termed 'resist nanokirigami', in which the resist structures are defined by their outlines and revealed by selective mechanical peeling of the unwanted resist film. Unlike conventional resist-based patterning processes, the final resist-nanokirigami structures do not undergo exposure and the exposure area is dramatically reduced. With these two advantages, a variety of functional structures that are difficult or impossible to fabricate by conventional processes, such as inverse nanostructures and their oligomers, multi-scale electrodes and freestanding plasmonic nanogaps, can be easily achieved with much higher efficiency. Thus, with its unique and complementary capabilities, the resist-nanokirigami process provides a new patterning solution that expands the family of lithography techniques and will play a significant role in fabricating multi-scale functional structures.
ABSTRACT
Planar heterostructures composed of two or more adjacent structures with different materials are a kind of building blocks for various applications in surface plasmon resonance sensors, rectifiers, photovoltaic devices, and ambipolar devices, but their reliable fabrication with controllable shape, size, and positioning accuracy remains challenging. In this work, we propose a concept for fabricating planar heterostructures via directional stripping and controlled nanofractures of metallic films, with which self-aligned, multimaterial, multiscale heterostructures with arbitrary geometries and sub-20 nm gaps can be obtained. By using a split ring as the template, the asymmetric nanofracture of the deposited film at the split position results in nonreciprocal peeling of the film in the split ring. Compared to the conventional processes, the final heterostructures are defined only by their outlines, thus providing the ability to fabricate complex heterostructures with higher resolutions. We demonstrate that this method can be used to fabricate heterodimers, multimaterial oligomers, and multiscale asymmetrical electrodes. An Ag-MoS2-Au photodiode with a strong rectification effect is fabricated based on the nanogap heterostructures prepared by this method. This technology provides a unique and reliable approach to define nanogap heterostructures, which are supposed to have potential applications in nanoelectronics, nanoplasmonics, nano-optoelectronics, and electrochemistry.
ABSTRACT
Face gear transmission is a kind of space-meshing mechanism that is mainly used in the field of aviation. Compared with traditional transmission, it has the advantages of stability, reliability, low noise, and strong carrying capacity. However, owing to its complex tooth surface, there are no means to accurately model the face gear. Likewise, research based on the geometry is difficult. Therefore, the tooth surface equation of the face gear is derived in this article based on the meshing theory. Based on the equations, the point cloud of the face gear tooth surface is calculated, the complex tooth surface is generated, and the face gear is accurately modeled. Moreover, taking tooth surface friction excitation into consideration, a multi-degree-of-freedom nonlinear dynamic model of face gear transmission system is established, using the adaptive variable step length Runge-Kutta method. As shown in the results, the bifurcation diagram, phase diagram, time history diagram, and Poincaré section diagram are combined to analyze the influence of tooth surface friction and meshing frequency on the dynamic characteristics of the system.
