ABSTRACT
Designing optics for photometry in the long-wavelength portion of the EUV spectrum (400-900 A) poses different problems from those arising for optics, operating shortward of 400 A. The available filter materials which transmit radiation longward of 400 A are also highly transparent at wavelengths shortward of 100 A. Conventional EUV optics, with grazing angles of less, similar10 degrees , have very high throughput in the EUV, which persists to wavelengths shortward of 100 A. Use of such optics with the longer-wavelength EUV filters thus results in an unacceptably large soft x-ray leak. We have overcome this problem by developing a mirror design with larger graze angles >/=20 degrees , which has high throughput at wavelengths longer than 400 A but at the same time very little throughput shortward of 100 A.
ABSTRACT
We have developed a modified Penning discharge lamp for use in the soft x-ray and extreme uv spectral regions. The source produces a number of intense lines in the 50-300-A range and can be operated for substantial periods of time at high output levels before refurbishment is required. Refurbishment of this source, when required, is very easily effected.