Single SiGe quantum dot emission deterministically enhanced in a high-Q photonic crystal resonator.

We report the resonantly enhanced radiative emission from a single SiGe quantum dot (QD), which is deterministically embedded into a bichromatic photonic crystal resonator (PhCR) at the position of its largest modal electric field by a scalable method. By optimizing our molecular beam epitaxy (MBE) growth technique, we were able to reduce the amount of Ge within the whole resonator to obtain an absolute minimum of exactly one QD, accurately positioned by lithographic methods relative to the PhCR, and an otherwise flat, a few monolayer thin, Ge wetting layer (WL). With this method, record quality (Q) factors for QD-loaded PhCRs up to Q ∼ 105 are achieved. A comparison with control PhCRs on samples containing a WL but no QDs is presented, as well as a detailed analysis of the dependence of the resonator-coupled emission on temperature, excitation intensity, and emission decay after pulsed excitation. Our findings undoubtedly confirm a single QD in the center of the resonator as a potentially novel photon source in the telecom spectral range.

Large-scale controlled coupling of single-photon emitters to high-index dielectric nanoantennas by AFM nanoxerography.

Improving the brightness of single-photon sources by means of optically resonant nanoantennas is a major stake for the development of efficient nanodevices for quantum communications. We demonstrate that nanoxerography by atomic force microscopy makes possible the fast, robust and repeatable positioning of model quantum nanoemitters (nitrogen-vacancy NV centers in nanodiamonds) on a large-scale in the gap of silicon nanoantennas with a dimer geometry. By tuning the parameters of the nanoxerography process, we can statistically control the number of deposited nanodiamonds, yielding configurations down to a unique single photon emitter coupled to these high index dielectric nanoantennas, with high selectivity and enhanced brightness induced by a near-field Purcell effect. Numerical simulations are in very good quantitative agreement with time-resolved photoluminescence experiments. A multipolar analysis reveals in particular all the aspects of the coupling between the dipolar single emitter and the Mie resonances hosted by these simple nanoantennas. This proof of principle opens a path to a genuine and large-scale spatial control of the coupling of punctual quantum nanoemitters to arrays of optimized optically resonant nanoantennas. It paves the way for future fundamental studies in quantum nano-optics and toward integrated photonics applications for quantum technologies.

Composition Dependent Electrical Transport in Si1-x Gex Nanosheets with Monolithic Single-Elementary Al Contacts.

Si1-x Gex is a key material in modern complementary metal-oxide-semiconductor and bipolar devices. However, despite considerable efforts in metal-silicide and -germanide compound material systems, reliability concerns have so far hindered the implementation of metal-Si1-x Gex junctions that are vital for diverse emerging "More than Moore" and quantum computing paradigms. In this respect, the systematic structural and electronic properties of Al-Si1-x Gex heterostructures, obtained from a thermally induced exchange between ultra-thin Si1-x Gex nanosheets and Al layers are reported. Remarkably, no intermetallic phases are found after the exchange process. Instead, abrupt, flat, and void-free junctions of high structural quality can be obtained. Interestingly, ultra-thin interfacial Si layers are formed between the metal and Si1-x Gex segments, explaining the morphologic stability. Integrated into omega-gated Schottky barrier transistors with the channel length being defined by the selective transformation of Si1-x Gex into single-elementary Al leads, a detailed analysis of the transport is conducted. In this respect, a report on a highly versatile platform with Si1-x Gex composition-dependent properties ranging from highly transparent contacts to distinct Schottky barriers is provided. Most notably, the presented abrupt, robust, and reliable metal-Si1-x Gex junctions can open up new device implementations for different types of emerging nanoelectronic, optoelectronic, and quantum devices.

A Direct Sensor to Measure Minute Liquid Flow Rates.

Nanofluidics finds its root in the study of fluids and flows at the nanoscale. Flow rate is a quantity that is both central when dealing with flows and notoriously difficult to measure experimentally at the scale of an individual nanopore or nanochannel. We show in this letter that minute flow rate can be directly measured accumulating liquid over time within the compliant membrane of a commercial piezoresistive pressure sensor. Our flow rate sensor is versatile and can be operated independently of the nature of the liquid, flow profile, and type of nanochannel. We demonstrate this method by measuring the pressure-driven flow of silicon oil in a single nanochannel of average radius 200 nm. This approach gives reliable measurement of the flow rate up to 1 pL/min. Unlike other nanoscale flow measurements methods based, for instance, on particle tracking, our sensor delivers a direct voltage output suitable for nanoflow control applications.

Fabrication of buckling free ultrathin silicon membranes by direct bonding with thermal difference.

An innovative method to fabricate large area (up to several squared millimeters) ultrathin (100 nm) monocrystalline silicon (Si) membranes is described. This process is based on the direct bonding of a silicon-on-insulator wafer with a preperforated silicon wafer. The stress generated by the thermal difference applied during the bonding process is exploited to produce buckling free silicon nanomembranes of large areas. The thermal differences required to achieve these membranes (≥1 mm(2)) are estimated by analytical calculations. An experimental study of the stress achievable by direct bonding through two specific surface preparations (hydrophobic or hydrophilic) is reported. Buckling free silicon nanomembranes secured on a 2 × 2 cm(2) frame with lateral dimensions up to 5 × 5 mm(2) are successfully fabricated using the optimized direct bonding process. The stress estimated by theoretical analysis is confirmed by Raman measurements, while the flatness of the nanomembranes is demonstrated by optical interferometry. The successful fabrications of high resolution (50 nm half pitch) tungsten gratings on the silicon nanomembranes and of focused ion beam milling nanostructures show the promising potential of the Si membranes for X-ray optics and for the emerging nanosensor market.