ABSTRACT
We report the results of the investigation of bulk and surface acoustic phonons in the undoped and boron-doped single-crystal diamond films using the Brillouin-Mandelstam light scattering spectroscopy. The evolution of the optical phonons in the same set of samples was monitored with Raman spectroscopy. It was found that the frequency and the group velocity of acoustic phonons decrease nonmonotonically with the increasing boron doping concentration, revealing pronounced phonon softening. The change in the velocity of the shear-horizontal and the high-frequency pseudo-longitudinal acoustic phonons in the degenerately doped diamond, as compared to that in the undoped diamond, was as large as â¼15% and â¼12%, respectively. As a result of boron doping, the velocity of the bulk longitudinal and transverse acoustic phonons decreased correspondingly. The frequency of the optical phonons was unaffected at low boron concentration but experienced a strong decrease at the high doping level. The density-functional-theory calculations of the phonon band structure for the pristine and highly doped samples confirm the phonon softening as a result of boron doping in diamond. The obtained results have important implications for thermal transport in heavily doped diamond, which is a promising material for ultra-wide-band-gap electronics.
ABSTRACT
GaN-on-diamond device cooling can be enhanced by reducing the effective thermal boundary resistance (TBReff) of the GaN/diamond interface. The thermal properties of this interface and of the polycrystalline diamond grown onto GaN using SiN and AlN barrier layers as well as without any barrier layer under different growth conditions are investigated and systematically compared for the first time. TBReff values are correlated with transmission electron microscopy analysis, showing that the lowest reported TBReff (â¼6.5 m2 K/GW) is obtained by using ultrathin SiN barrier layers with a smooth interface formed, whereas the direct growth of diamond onto GaN results in one to two orders of magnitude higher TBReff due to the formation of a rough interface. AlN barrier layers can produce a TBReff as low as SiN barrier layers in some cases; however, their TBReff are rather dependent on growth conditions. We also observe a decreasing diamond thermal resistance with increasing growth temperature.
ABSTRACT
The design and experimental operation of a compact microwave/rf applicator is described. This applicator operates at atmospheric pressure and couples electromagnetic energy into a premixed CH(4)/O(2) flame. The addition of only 2-15 W of microwave power to a premixed combustion flame with a flame power of 10-40 W serves to extend the flammability limits for fuel lean conditions, increases the flame length and intensity, and increases the number density and mixture of excited radical species in the flame vicinity. The downstream gas temperature also increases. Optical emission spectroscopy measurements show gas rotational temperatures in the range of 2500-3600 K. At the higher input power of > or = 10 W microplasma discharges can be produced in the high electric field region of the applicator.
