Fabrication of antibacterial polydopamine-carboxymethyl cellulose-Ag nanoparticle hydrogel coating for urinary catheters.

Urinary tract infections caused by catheter insertion are prevalent in hospital clinics, which can induce serious complications such as bacteriuria and sepsis, and even lead to patient death. The disposable catheters currently used in clinical practice suffer from poor biocompatibility and high infection rate. In this paper, we developed a polydopamine (PDA)-carboxymethylcellulose (CMC)-Ag nanoparticles (AgNPs) coating with both good antibacterial and anti-adhesion properties to bacteria on the surfaces of a disposable medical latex catheter by a simple dipping method. The antibacterial efficiency of the coated catheters against Gram-negative E. coli and Gram-positive S. aureus bacteria was evaluated with both inhibition zone tests and fluorescence microscopy. Compared with the untreated catheter, the PDA-CMC-AgNPs coated catheters showed both good antibacterial and anti-adhesion properties to bacteria, which inhibited the adhesion of live bacteria and dead bacteria by 99.0% and 86.6%, respectively. This novel PDA-CMC-AgNPs composite hydrogel coating has great potential in applications in catheters and other biomedical devices to reduce infections.

An oxygen-insensitive degradable resist for fabricating metallic patterns on highly curved surfaces by UV-nanoimprint lithography.

In this paper, an oxygen-insensitive degradable resist for UV-nanoimprint is designed, com-prising a polycyclic degradable acrylate monomer, 2,10-diacryloyloxymethyl-1,4,9,12-tetraoxa-spiro [4.2.4.2] tetradecane (DAMTT), and a multifunctional thiol monomer pentaerythritol tetra(3-mercaptopropionate) (PETMP). The resist can be quickly UV-cured in the air atmosphere and achieve a high monomer conversion of over 98%, which greatly reduce the adhesion force between the resist and the soft mold. High conversion, in company with an adequate Young's modulus (about 1 GPa) and an extremely low shrinkage (1.34%), promises high nanoimprint resolution of sub-50 nm. The cross-linked resist is able to break into linear molecules in a hot acid solvent. As a result, metallic patterns are fabricated on highly curved surfaces via the lift off process without the assistance of a thermoplastic polymer layer.