Textured Manganite Films Anywhere.

New paradigms are required in microelectronics when the transistor is in its downscaling limit and integration of materials presenting functional properties not available in classical silicon is one of the promising alternatives. Here, we demonstrate the possibility to grow La0.67Sr0.33MnO3 (LSMO) functional materials on amorphous substrates with properties close to films grown on single-crystalline substrates using a two-dimensional seed layer. X-ray diffraction and electron backscatter diffraction mapping demonstrate that the Ca2Nb3O10- nanosheet (NS) layer induces epitaxial stabilization of LSMO films with a strong out-of-plane (001) texture, whereas the growth of LSMO films on uncoated glass substrates exhibits a nontextured polycrystalline phase. The magnetic properties of LSMO films deposited on NS are similar to those of the LSMO grown on SrTiO3 single-crystal substrates in the same conditions (which is used as a reference in this work). Moreover, transport measurements take advantages of the texture and polycrystalline properties to induce low-field magnetoresistance at low temperature and also a high value of 40% magnetoresistance from 10 to 300 K, making it interesting for sensor applications. Therefore, the NS seed layer offers new perspectives for the integration of functional materials grown at moderate temperatures on any substrate, which will be the key for the development of oxitronics.

In Situ Synchrotron Powder Diffraction Study of Cd Intercalation into Chevrel Phases: Crystal Structure and Kinetic Effect.

Chevrel phases are molybdenum chalcogenides of formula M xMo6X8 (where M is a cation and X is a chalcogen) that present a complex and captivating intercalation chemistry that has drawn the interest of the solid-state chemistry community since their discovery. This property has a huge potential for applied science and device development for energy storage and pollutant removal and detection, but a deeper knowledge of the intercalation processes and chemistry is still necessary. In the present work, the intercalation of Cd2+ in aqueous solution has been studied, taking advantage of the complementarity of electrochemical characterization and synchrotron powder diffraction acquired during an in situ combined experiment. During the experiment, industrially adequate electrochemical conditions (room temperature and reduced process time) were applied, allowing a better understanding of the intercalation processes. The intercalated phases obtained by electrochemistry have been characterized ex situ, and for the first time the structures of Cd2Mo6X8 (X = S, Se) have been determined. Unexpectedly, Cd2Mo6Se8 presents a trigonal crystal structure with only cavity 2 occupied, which has not been encountered before for Chevrel phases.

A Twofold Approach in Loss Reduction of KTa0.5Nb0.5O3 Ferroelectric Layers for Low-Loss Tunable Devices at Microwaves.

Ferroelectric oxide films are attractive to design and fabricate reconfigurable and miniaturized planar devices operating at microwaves due to the large electric field dependence of their dielectric permittivity. In particular, KTa1-xNbxO3 (KTN) ferroelectric material presents a high tunability under moderate dc bias electric field. However, its intrinsic dielectric loss strongly contributes to the global loss of the related devices and limits their application areas at microwaves. In this paper, a twofold approach is investigated to reduce the device loss. The intrinsic loss of KTN is first reduced by doping the ferroelectric material with a low-loss dielectric material, namely, MgO. Second, the doped ferroelectric films are confined using an original laser microetching process. Both routes have been implemented here to provide a synergic effect on the total insertion loss of the microwave test device, namely, a coplanar waveguide stub resonator. The experimental data demonstrate a decrease of the intrinsic loss by a factor of ~2 and a decrease of the global loss by a factor of ~4 with a frequency tunability close to 10% at ~10 GHz under a moderate biasing (80 kV/cm).

Reactivity of platinum metal with organic radical anions from metal to negative oxidation states.

The reaction of platinum metal with an organic molecular radical anion leads to the formation of iono-metallic phases where Pt exists under negative oxidation states. This puzzling transformation of a "noncorrodible metal" was examined using localized electrochemical techniques in dimethylformamide containing different tetra-alkylammonium salts chosen as test systems. Our experiments demonstrate that the platinum metal is locally reduced as soon as the Pt faces relatively moderate reducing conditions, for example, when the Pt is used as a negative electrode or when the metal is in the presence of a reducing agent such as an organic radical anion. Scanning electrochemical microscopy (SECM) analysis, current-distance curves, and transient mode responses provide detailed descriptions of the reactivity of Pt to form negative oxidation states (the key step is the reaction of the metal with a molecular reducing agent), of the insulating nature of the "reduced" solid phases of the thermodynamics and kinetics conditions of the Pt conversion. The passage from the conductor to insulator states controlled the spatial development of the reaction that always remains in competition with the other "natural" roles of a metallic electrode. Formally, the phenomena can be treated by analogy with the C. Amatore's model previously developed for the mediated reduction of the poly(tetrafluoroethylene). Consequences of this general reactivity of Pt are discussed in view of a wide utilization of this metal in reductive conditions and the possible applications of such processes in the micropatterning of metallic surfaces.

KTa0.6Nb0.4O3 ferroelectric thin film behavior at microwave frequencies for tunable applications.

In this study about the relationships between structural and microwave electrical properties of KTa(1-x)NbxO3 (KTN) ferroelectric materials, a KTN thin film was deposited on different substrates to investigate how KTN growth affects the microwave behavior. Interdigital capacitors and stubs were made on these films through a simple engraving process. Microwave measurements under a static electric field showed the importance of the substrate on the circuit behavior and, notably, on the tuning factor.