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Biotechnol Prog ; 36(2): e2929, 2020 03.
Article in English | MEDLINE | ID: mdl-31622541

ABSTRACT

As the biopharmaceutical industry moves toward high concentration of monoclonal antibody drug substance, additional development is required early on when material is still limited. A key constraint is the availability of predictive high-throughput low-volume filtration screening systems for bioprocess development. This particularly impacts final stages such as ultrafiltration/diafiltration steps where traditional scale-down systems need hundreds of milliliters of material per run. Recently, the ambr® crossflow system has been commercialized by Sartorius Stedim Biotech (SSB) to meet this need. It enables parallel high throughput experimentation by only using a fraction of typical material requirements. Critical parameters for predictive filtration systems include loading, mean transmembrane pressure (Δ P¯TMP ), and crossflow rate (QF ). While axial pressure drop (ΔPaxial ) across the cartridge is a function of these parameters, it plays a key role and similar values should result across scales. The ambr® crossflow system is first presented describing typical screening experiments. Its performance is then compared to a traditional pilot-scale tangential flow filtration (TFF) at defined conditions. The original ambr® crossflow (CF) cartridge underperformed resulting in ~20x lower ΔPaxial than the pilot-scale TFF flat-sheet cassette. With an objective to improve the scalability of the system, efforts were made to understand this scale difference. The ambr® CF cartridge was successfully modified by restricting the flow of the feed channel, and thus increasing its ΔPaxial . Additional studies across a range of loading (100-823 gm-2 ); Δ P¯TMP (12-18 psi); and QF (4-8 L/min/m2 ) were conducted in both scales. Comparable flux and aggregate levels were achieved.


Subject(s)
Antibodies, Monoclonal/isolation & purification , Filtration , Fractionation, Field Flow , High-Throughput Screening Assays , Antibodies, Monoclonal/chemistry , Pressure
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