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1.
Adv Mater ; 25(12): 1739-44, 2013 Mar 25.
Article in English | MEDLINE | ID: mdl-23359435

ABSTRACT

Copolymers with a triscarbazole hole-transport group and an oxetane or benzocyclobutene crosslinkable group can be readily thermally crosslinked on timescales of 30 min or less, with rapid thermal processing (RTP) being highly effective for this purpose. Devices with RTP-crosslinked hole-transport layers and spin-coated emissive layers exhibit high external quantum efficiencies of up to 15%.


Subject(s)
Lighting/instrumentation , Luminescent Agents/chemistry , Organic Chemicals/chemistry , Temperature , Silicon/chemistry , Solutions
2.
Science ; 336(6079): 327-32, 2012 Apr 20.
Article in English | MEDLINE | ID: mdl-22517855

ABSTRACT

Organic and printed electronics technologies require conductors with a work function that is sufficiently low to facilitate the transport of electrons in and out of various optoelectronic devices. We show that surface modifiers based on polymers containing simple aliphatic amine groups substantially reduce the work function of conductors including metals, transparent conductive metal oxides, conducting polymers, and graphene. The reduction arises from physisorption of the neutral polymer, which turns the modified conductors into efficient electron-selective electrodes in organic optoelectronic devices. These polymer surface modifiers are processed in air from solution, providing an appealing alternative to chemically reactive low-work function metals. Their use can pave the way to simplified manufacturing of low-cost and large-area organic electronic technologies.

3.
Opt Express ; 15(6): 3426-36, 2007 Mar 19.
Article in English | MEDLINE | ID: mdl-19532584

ABSTRACT

Nanoscale features as small as 65 +/- 5 nm have been formed reproducibly by using 520 nm femtosecond pulsed excitation of a 4,4'-bis(di-n-butylamino)biphenyl chromophore to initiate crosslinking in a triacrylate blend. Dosimetry studies of the photoinduced polymerization were performed on chromophores with sizable two-photon absorption cross-sections at 520 and 730 nm. These studies show that sub-diffraction limited line widths are obtained in both cases with the lines written at 520 nm being smaller. Three-dimensional multiphoton lithography at 520 nm has been used to fabricate polymeric woodpile photonic crystal structures that show stop bands in the near-infrared spectral region.

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