Plasmonic nanostructured metal-oxide-semiconductor reflection modulators.

We propose a plasmonic surface that produces an electrically controlled reflectance as a high-speed intensity modulator. The device is conceived as a metal-oxide-semiconductor capacitor on silicon with its metal structured as a thin patch bearing a contiguous nanoscale grating. The metal structure serves multiple functions as a driving electrode and as a grating coupler for perpendicularly incident p-polarized light to surface plasmons supported by the patch. Modulation is produced by charging and discharging the capacitor and exploiting the carrier refraction effect in silicon along with the high sensitivity of strongly confined surface plasmons to index perturbations. The area of the modulator is set by the area of the incident beam, leading to a very compact device for a strongly focused beam (∼2.5 µm in diameter). Theoretically, the modulator can operate over a broad electrical bandwidth (tens of gigahertz) with a modulation depth of 3 to 6%, a loss of 3 to 4 dB, and an optical bandwidth of about 50 nm. About 1000 modulators can be integrated over a 50 mm(2) area producing an aggregate electro-optic modulation rate in excess of 1 Tb/s. We demonstrate experimentally modulators operating at telecommunications wavelengths, fabricated as nanostructured Au/HfO2/p-Si capacitors. The modulators break conceptually from waveguide-based devices and belong to the same class of devices as surface photodetectors and vertical cavity surface-emitting lasers.

Fabrication of a plasmonic modulator incorporating an overlaid grating coupler.

The fabrication of a novel plasmonic reflection modulator is presented and described. The modulator includes plasmon excitation using a diffraction grating coupler and is based on a metal-insulator-semiconductor structure on silicon. Fabrication includes a thin thermal oxide, a plasmonic metal surface defined by optical lithography, a metal grating coupler defined by overlaid e-beam lithography, a passivation layer with metalized vias, and electrical contacts. Physical characterization of intermediate structures is provided along with modulation measurements at λ0 ∼ 1550 nm which verify the concept.

Atomically flat symmetric elliptical nanohole arrays in a gold film for ultrasensitive refractive index sensing.

Past works on refractive index sensing using nanohole arrays in metal films typically achieved a resolution of around 10(-4) to 10(-5) refractive index units (RIU), up to 10(-6) with complicated detection setups. This is an order of magnitude worse than commercial Kretschmann-based surface-plasmon resonance (SPR) sensors. Here, we demonstrate intensity-based bulk refractive index sensing in an aqueous environment with a resolution of 9.38 × 10(-8) refractive index units (RIU), showing for the first time comparable performance for nanohole SPR with Kretschmann-based SPR. This is achieved by the combination of three advances in the materials properties: (a) template stripping to achieve ultra-flat Au surfaces of ~0.2 nm roughness, (b) elliptical nanoholes to enhance transmission, and (c) a Cytop substrate to symmetrize the refractive index with the aqueous environment above the metal film. The simple optical microscope geometry and microfluidic integration used in this work is promising for multiplexed lab-on-chip analysis.