Protocol for fabricating a photonic structure consisting of ZnO/Ag/ZnO film perforated with 2D periodic apertures based on photolithography technology.

A ZnO/Ag/ZnO film with 2D periodic apertures can have a high visible transmittance and low emittances in atmospheric windows for visible-infrared compatible camouflage and a high transmittance in 5-8 µm for heat dissipation by radiation. This following protocol details the fabrication process of such a photonic structure based on photolithography technology. Also described are the related challenges and troubleshooting steps. For complete details on the use and execution of this protocol, please refer to Dang and Ye (2021).