ABSTRACT
Millimeter-wave (mm-wave) communications and radar receivers must be protected from high-power signals, which can damage their sensitive components. Many of these systems arguably can be protected by using photonic limiting techniques, in addition to electronic limiting circuits in receiver front-ends. Here we demonstrate, experimentally and numerically, a free-space, reflective mm-wave limiter based on a multilayer structure involving a nanolayer of vanadium dioxide VO2, which experiences a heat-related insulator-to-metal phase transition. The multilayer acts as a variable reflector, controlled by the incident wave intensity. At low intensities VO2 remains dielectric, and the multilayer exhibits strong resonant transmittance. When the incident intensity exceeds a threshold level, the emerging metallic phase renders the multilayer highly reflective while safely dissipating a small portion of the input power, without damage to the limiter. In the case of a Gaussian beam, the limiter has a nearly constant output above the limiting threshold input.
ABSTRACT
Upcoming advancements in flexible technology require mechanically compliant dielectric materials. Current dielectrics have either high dielectric constant, K (e.g., metal oxides) or good flexibility (e.g., polymers). Here, we achieve a golden mean of these properties and obtain a lightweight, viscoelastic, high-K dielectric material by combining two nonpolar, brittle constituents, namely, sulfur (S) and selenium (Se). This S-Se alloy retains polymer-like mechanical flexibility along with a dielectric strength (40 kV/mm) and a high dielectric constant (K = 74 at 1 MHz) similar to those of established metal oxides. Our theoretical model suggests that the principal reason is the strong dipole moment generated due to the unique structural orientation between S and Se atoms. The S-Se alloys can bridge the chasm between mechanically soft and high-K dielectric materials toward several flexible device applications.
ABSTRACT
The dielectric anisotropy of Al2O3 is studied here by characterizing W-band (75-110 GHz) complex permittivity of four different orientations of sapphire (Al2O3 single crystals). This was done using free-space, focused beam methods. Dielectric polarizability ([Formula: see text]) of these orientations is then calculated and these values are related to their complex permittivity. Based on this relationship, a framework is developed for rapid and straightforward estimation of dielectric anisotropy using a known crystal structure and a dielectric permittivity measurement performed on one orientation of the material. This framework can be applied to other materials with dielectric anisotropy (e.g. SnO2, LiGaO2) to predict permittivity for different orientations, enabling rapid design of high-frequency systems (e.g. radomes, electromagnetic windows). These permittivity measurements were also used to determine the dominant polarization mechanisms leading to dielectric anisotropy of Al2O3 in the W-band; electronic and ionic polarization orthogonal to the direction of the focused beam.
ABSTRACT
With the progression of high-power electric propulsion and high thrust-to-power propulsions system, thrust stand diagnostics require high-fidelity calibration systems that are accurate over a large-range of thrust levels. Multi-mode and variable I(sp) propulsion devices also require that a single stand be capable of measuring thrust from 10's of uNs to 100's of mNs. While the torsional thrust stand mechanic and diagnostics are capable of operating over such a large range, current pulsed calibration schemes are typically limited to a few orders of magnitude of dynamic range. In order to develop a stand with enough dynamic range, two separate calibration methods have been examined and compared to create a combined system. Electrostatic fin (ESF) and piezoelectric impact hammer (PIH) calibration systems were simultaneously tested on a large scale torsional thrust stand system. The use of the these two methods allowed the stand to be calibrated over four orders of magnitude, from 0.01 mNs to 750 mNs. The ESF system produced linear results within 0.52% from 0.01 mNs to 20 mNs, while the PIH system extended this calibration range from 10 mNs to 750 mNs with an error of 0.99%. The two calibration methods agreed within 4.51% over their overlapping range of 10-20 mNs.