ABSTRACT
The manufacturing process for an ultrawide flexible microwave absorbing meta-surface was developed and optimized experimentally. The developed replication process consists of four main steps to demonstrate double-square loop array meta-structures: (1) mechanical machining of a master mold, (2) soft mold replication and patterned film imprinting, (3) conductive ink blade filling, (4) lamination of a base flexible film to meta sheet. Based on experimental optimization of the individual steps, the manufacturing process for a large-area flexible meta-film was established successfully. The feasibility of a developed process has been demonstrated with a 200 mm × 500 mm fabricated meta-film with a focus on microwave absorbing uniformity in the X-band region.
ABSTRACT
Recent advances in metasurfaces and optical nanostructures have enabled complex control of incident light with optically thin devices. However, it has thus far been unclear whether it is possible to achieve complete linear control of coherent light transmission, that is, independent control of polarization, amplitude, and phase for both input polarization states, with just a single, thin nanostructure array. Here, it is proved possible, and a universal metasurface is proposed, a bilayer array of high-index elliptic cylinders that possesses a complete degree of optical freedom with fully designable chirality and anisotropy. The completeness of achievable light control is mathematically shown with corresponding Jones matrices, new types of 3D holographic schemes that were formerly impossible are experimentally demonstrated, and a systematic way of realizing any input-state-sensitive vector linear optical device is presented. The results unlock previously inaccessible degrees of freedom in light transmission control.
ABSTRACT
Microwave absorbers using conductive ink are generally fabricated by printing an array pattern on a substrate to generate electromagnetic fields. However, screen printing processes are difficult to vary the sheet resistance values for different regions of the pattern on the same layer, because the printing process deposits materials at the same height over the entire surface of substrate. In this study, a promising manufacturing process was suggested for engraved resistive double square loop arrays with ultra-wide bandwidth microwave. The developed manufacturing process consists of a micro-end-milling, inking, and planing processes. A 144-number of double square loop array was precisely machined on a polymethyl methacrylate workpiece with the micro-end-milling process. After engraving array structures, the machined surface was completely covered with the developed conductive carbon ink with a sheet resistance of 15 Ω/sq. It was cured at room temperature. Excluding the ink that filled the machined double square loop array, overflowed ink was removed with the planing process to achieve full filled and isolated resistive array patterns. The fabricated microwave absorber showed a small radar cross-section with reflectance less than - 10 dB in the frequency band range of 8.0-14.6 GHz.
ABSTRACT
In optical nanostructures used as artificial resonance-based color filters, there is unfortunate universal trade-off between spectral sharpness and angular tolerance as well as maximum extinction. We rigorously derive the maximum performance bounds of wavelength-rejection filters realized by single-layer plasmonic metasurfaces with a dominant resonance and weak near-field coupling, and propose a multi-layer approach to overcome these single-layer limits and trade-offs. We also present a realistic example that has a narrow full-width-at-half-maximum bandwidth of 24 nm with 10 dB extinction at 532 nm with good angular tolerance up to 60°. The performance of the proposed metasurface is close to the general theoretical bound.
