ABSTRACT
This work is devoted to the research of influence of annealing to ferromagnetic resonance (FMR) properties of films of the A, B series with the compositions of (Co45-Fe45-Zr10)x(Al2O3)y, multilayer films of the D series with compositions {[(Co45-Fe45-Zr10)x(Al2O3)y]-[alpha-Si]}120 and revealing their relationship with the nanostructure characteristics. The films were obtained in an argon atmosphere (the A, D series) and with addition of oxygen (the B series). All samples were deposited on substrates by the ion-beam sputtering method and were annealed. The resonant fields and width of ferromagnetic resonance (FMR) line were measured before and after annealing. The changes in the FMR field and width of the line at varying temperatures of annealing for the composite and multilayer films are analyzed in the work. The character of changes in the structural characteristics of films at different annealing temperatures is determined.
