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Phys Rev E Stat Nonlin Soft Matter Phys ; 64(3 Pt 2): 036404, 2001 Sep.
Article in English | MEDLINE | ID: mdl-11580451

ABSTRACT

Large Xe clusters (10(5)-10(6) atoms per cluster) have been irradiated with ultrashort (50 fs) and high-intensity ( approximately 2 x 10(18) W/cm(2)) pulses from a Ti:sapphire multi-TW laser at 800 nm wavelength. Scaling and absolute yield measurements of extreme ultraviolet (EUV) emission in a wavelength range between 7 and 15 nm in combination with cluster target characterization have been used for yield optimization. Maximum emission as a function of the backing pressure and a spatial emission anisotropy covering a factor of two at optimized yields is discussed with a simple model of the source geometry and EUV-radiation absorption. Circularly polarized laser light instead of linear polarization results in a factor of 2.5 higher emission in the 11 to 15 nm wavelength range. This indicates the initial influence of optical-field ionization for the interaction parameter range used and contrasts to collisional heating that seems to influence preferentially higher ionization. Absolute emission efficiency at 13.4 nm of up to 0.5% in 2pi sr and 2.2% bandwidth has been obtained.


Subject(s)
Lasers , Ultraviolet Rays , Xenon , Anisotropy , Ions , Physical Phenomena , Physics , Pressure , Time Factors
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