A predictive model of the tensile strength of twisted carbon nanotube yarns.

Due to the outstanding mechanical properties of individual carbon nanotubes (CNTs) at the nanoscale, CNT yarns are expected to demonstrate high strength at the macroscale. In this study, a predictable model was developed to predict the tensile strength of twisted CNT yarns. First, the failure mechanism of twisted CNT yarns was investigated using in situ tensile tests and ex situ observations. It was revealed that CNT bundles, which are groups of CNTs that are tightly bound together, formed during tensile loading, leaving some voids around the bundles. Failure of the CNT yarns occurred as the CNT bundles were pulled out of the yarns. Two stresses that determined the tensile strength of the CNT yarns were identified: interfacial shear and frictional stresses originating from van der Waals interactions, and the lateral pressure generated by the twisted yarn structure. Molecular dynamics and yarn mechanics were used to calculate these two stresses. Finally, the tensile strength of CNT yarns was predicted and compared with experimental data, showing reasonable agreement.

Design and application of a novel in situ nano-manipulation stage for transmission electron microscopy.

A novel nano-scale manipulator capable of handling low-dimensional materials with three-dimensional linear motion, gripping action, and push-pull action of the gripper was developed for an in situ experiment in transmission electron microscopy. X-Y-Z positioning and push-pull action were accomplished by a piezotubing system, combined with a specially designed assembly stage that consisted of a lever-action gripping tip backed by a push-pull piezostack. The gripper tip consisted of tungsten wire fabricated by electrochemical etching followed by a focused ion beam process. Performance of the nano-scale manipulator was demonstrated in a grab-and-pick test of a single silver nanowire and in an in situ tensile test of a pearlitic steel sample with a specific orientation.

Graphene as an atomically thin barrier to Cu diffusion into Si.

The evolution of copper-based interconnects requires the realization of an ultrathin diffusion barrier layer between the Cu interconnect and insulating layers. The present work reports the use of atomically thin layer graphene as a diffusion barrier to Cu metallization. The diffusion barrier performance is investigated by varying the grain size and thickness of the graphene layer; single-layer graphene of average grain size 2 ± 1 µm (denoted small-grain SLG), single-layer graphene of average grain size 10 ± 2 µm (denoted large-grain SLG), and multi-layer graphene (MLG) of thickness 5-10 nm. The thermal stability of these barriers is investigated after annealing Cu/small-grain SLG/Si, Cu/large-grain SLG/Si, and Cu/MLG/Si stacks at different temperatures ranging from 500 to 900 °C. X-ray diffraction, transmission electron microscopy, and time-of-flight secondary ion mass spectroscopy analyses confirm that the small-grain SLG barrier is stable after annealing up to 700 °C and that the large-grain SLG and MLG barriers are stable after annealing at 900 °C for 30 min under a mixed Ar and H2 gas atmosphere. The time-dependent dielectric breakdown (TDDB) test is used to evaluate graphene as a Cu diffusion barrier under real device operating conditions, revealing that both large-grain SLG and MLG have excellent barrier performance, while small-grain SLG fails quickly. Notably, the large-grain SLG acts as a better diffusion barrier than the thicker MLG in the TDDB test, indicating that the grain boundary density of a graphene diffusion barrier is more important than its thickness. The near-zero-thickness SLG serves as a promising Cu diffusion barrier for advanced metallization.

Synthesis of few-layered graphene nanoballs with copper cores using solid carbon source.

We report the fabrication of graphene-encapsulated nanoballs with copper nanoparticle (Cu NP) cores whose size range from 40 nm to 1 µm using a solid carbon source of poly(methyl methacrylate) (PMMA). The Cu NPs were prone to agglomerate during the annealing process at high temperatures of 800 to 900 °C when gas carbon source such as methane was used for the growth of graphene. On the contrary, the morphologies of the Cu NPs were unchanged during the growth of graphene at the same temperature range when PMMA coating was used. The solid source of PMMA was first converted to amorphous carbon layers through a pyrolysis process at the temperature regime of 400 °C, which prevented the Cu NPs from agglomeration, and they were converted to few-layered graphene (FLG) at the elevated temperatures. Raman and transmission electron microscope analyses confirmed the synthesis of FLG with thickness of approximately 3 nm directly on the surface of the Cu NPs. X-ray diffraction and X-ray photoelectron spectroscopy analyses, along with electrical resistance measurement according to temperature changes showed that the FLG-encapsulated Cu NPs were highly resistant to oxidation even after exposure to severe oxidation conditions.

Design, synthesis, and biological evaluation of novel constrained meta-substituted phenyl propanoic acids as peroxisome proliferator-activated receptor alpha and gamma dual agonists.

In an effort to develop dual PPARalpha/gamma activators with improved therapeutic efficacy, a series of diaryl alpha-ethoxy propanoic acid compounds comprising two aryl groups linked by rigid oxime ether or isoxazoline ring were designed and synthesized and their biological activities were examined. Most of the compounds possessing an oxime ether linker were more potent PPARgamma activators than the lead PPARalpha/gamma dual agonist, tesaglitazar in vitro. Compound 18, one of the derivatives with an oxime ether linker, was found to selectively transactivate PPARgamma (EC 50 = 0.028 microM) over PPARalpha (EC 50 = 7.22 microM) in vitro and lower blood glucose in db/ db mice more than muraglitazar after oral treatment for 11 days.

Design, synthesis, and structure-activity relationship of carbamate-tethered aryl propanoic acids as novel PPARalpha/gamma dual agonists.

We have developed a new class of PPARalpha/gamma dual agonists, which show excellent agonistic activity in PPARalpha/gamma transactivation assay. In particular, (R)-9d was identified as a potent PPARalpha/gamma dual agonist with EC(50)s of 0.377 microM in PPARalpha and 0.136 microM in PPARgamma, respectively. Interestingly, the structure-activity relationship revealed that the stereochemistry of the identified PPARalpha/gamma dual agonists significantly affects their agonistic activities in PPARalpha than in PPARgamma.