ABSTRACT
In this study, we investigate the effects of deposition parameters (i.e. gas flow rates, bias voltages, and nozzle-to-substrate separation) on the microstructure of <100 nm thick gold deposits made with a room-temperature, atmospheric-pressure, ion-drag microsputterer. Without resorting to the use of vacuum or substrate heating, optimization of the printing process yields dense, continuous deposits (96.5% coverage) with low electrical resistivity (45 µΩ cm). Using statistical analysis, we developed a simple model that provides insight into the dynamics of such a printing method; based on this model, we identify electrostatic effects as the most important factor that influences the deposition process.
ABSTRACT
An onion-peeling technique is developed for inferring the emissivity profile of a stellarator plasma from a two-dimensional image acquired through a CCD or CMOS camera. Each pixel in the image is treated as an integral of emission along a particular line-of-sight. Additionally, the flux surfaces in the plasma are partitioned into discrete layers, each of which is assumed to have uniform emissivity. If the topology of the flux surfaces is known, this construction permits the development of a system of linear equations that can be solved for the emissivity of each layer. We present initial results of this method applied to wide-angle visible images of the Columbia Neutral Torus (CNT) stellarator plasma.