ABSTRACT
Phosphorus (P) is an important nutrient in plant nutrition. Its absorption by plants from the soil is influenced by many factors. Therefore, a foliar application of this nutrient could be utilized for the optimal nutrition state of plants. The premise of the study is that foliar application of phosphorus will increase the yield of normal-phytate (npa) cultivars (CDC Bronco a Cutlass) and low-phytate (lpa) lines (1-2347-144, 1-150-81) grown in soils with low phosphorus supply and affect seed quality depending on the ability of the pea to produce phytate. A graded application of phosphorus (H3PO4) in four doses: without P (P0), 27.3 mg P (P1), 54.5 mg P (P2), and 81.8 mg P/pot (P3) realized at the development stages of the 6th true leaf led to a significant increase of chlorophyll contents, and fluorescence parameters of chlorophyll expressing the CO2 assimilation velocity. The P fertilization increased the yield of seeds significantly, except the highest dose of phosphorus (P3) at which the yield of the npa cultivars was reduced. The line 1-2347-144 was the most sensible to the P application when the dose P3 increased the seed production by 42.1%. Only the lpa line 1-150-81 showed a decreased tendency in the phytate content at the stepped application of the P nutrition. Foliar application of phosphorus significantly increased ash material in seed, but did not tend to affect the protein and mineral content of seeds. Only the zinc content in seeds was significantly reduced by foliar application of P in npa and lpa pea genotypes. It is concluded from the present study that foliar phosphorus application could be an effective way to enhance the pea growth in P-deficient condition with a direct effect on seed yield and quality.
ABSTRACT
In this work, the potential of a microwave (MW)-induced atmospheric pressure plasma jet (APPJ) in film deposition of styrene and methyl methacrylate (MMA) precursors is investigated. Plasma properties during the deposition and resultant coating characteristics are studied. Optical emission spectroscopy (OES) results indicate a higher degree of monomer dissociation in the APPJ with increasing power and a carrier gas flow rate of up to 250 standard cubic centimeters per minute (sccm). Computational fluid dynamic (CFD) simulations demonstrate non-uniform monomer distribution near the substrate and the dependency of the deposition area on the monomer-containing gas flow rate. A non-homogeneous surface morphology and topography of the deposited coatings is also observed using atomic force microscopy (AFM) and SEM. Coating chemical analysis and wettability are studied by XPS and water contact angle (WCA), respectively. A lower monomer flow rate was found to result in a higher C-O/C-C ratio and a higher wettability of the deposited coatings.
