ABSTRACT
RHIC electron beam ion source has been commissioned to operate as a versatile ion source on RHIC injection facility supplying ion species from He to Au for Booster. Except for light gaseous elements RHIC EBIS employs ion injection from several external primary ion sources. With electrostatic optics fast switching from one ion species to another can be done on a pulse to pulse mode. The design of an ion optical structure and the results of simulations for different ion species are presented. In the choice of optical elements special attention was paid to spherical aberrations for high-current space charge dominated ion beams. The combination of a gridded lens and a magnet lens in LEBT provides flexibility of optical control for a wide range of ion species to satisfy acceptance parameters of RFQ. The results of ion transmission measurements are presented.
ABSTRACT
As part of a new heavy ion preinjector that will supply beams for the Relativistic Heavy Ion Collider and the National Aeronautics and Space Administration Space Radiation Laboratory, construction of a new electron beam ion source (EBIS) is now being completed. This source, based on the successful prototype Brookhaven National Laboratory Test EBIS, is designed to produce milliampere level currents of all ion species, with q/m=(1/6)-(1/2). Among the major components of this source are a 5 T, 2-m-long, 204 mm diameter warm bore superconducting solenoid, an electron gun designed to operate at a nominal current of 10 A, and an electron collector designed to dissipate approximately 300 kW of peak power. Careful attention has been paid to the design of the vacuum system, since a pressure of 10(-10) Torr is required in the trap region. The source includes several differential pumping stages, the trap can be baked to 400 C, and there are non-evaporable getter strips in the trap region. Power supplies include a 15 A, 15 kV electron collector power supply, and fast switchable power supplies for most of the 16 electrodes used for varying the trap potential distribution for ion injection, confinement, and extraction. The EBIS source and all EBIS power supplies sit on an isolated platform, which is pulsed up to a maximum of 100 kV during ion extraction. The EBIS is now fully assembled, and operation will be beginning following final vacuum and power supply tests. Details of the EBIS components are presented.
ABSTRACT
The efficiency of trapping ions in an electron-beam ion source (EBIS) is of primary importance for many applications requiring operations with externally produced ions: RIA breeders, ion sources, and traps. At the present time, the most popular method of ion injection is pulsed injection, when short bunches of ions get trapped in a longitudinal trap while traversing the trap region. Continuous trapping is a challenge for EBIS devices because mechanisms which reduce the longitudinal ion energy per charge in a trap (cooling with residual gas, energy exchange with other ions, and ionization) are not very effective, and accumulation of ions is slow. A possible approach to increase trapping efficiency is to slant the mirror at the end of the trap which is opposite to the injection end. A slanted mirror will convert longitudinal motion of ions into transverse motion, and, by reducing their longitudinal velocity, prevent these ions from escaping the trap on their way out. The trade-off for the increased trapping efficiency this way is an increase in the initial transverse energy of the accumulated ions. The slanted mirror can be realized if the ends of two adjacent electrodes, drift tubes, which act as an electrostatic mirror, are machined to produce a slanted gap, rather than an upright one. Applying different voltages to these electrodes will produce a slanted mirror. The results of two-dimensional (2D) and three-dimensional (3D) computer simulations of the ion injection into an EBIS are presented using simplified models of an EBIS with conical (2D simulations) and slanted (3D simulations) mirror electrodes.
