Direct in situ nitridation of nanostructured metal oxide deposited semiconductor interfaces: tuning the response of reversibly interacting sensor sites.

Metal-oxide nanostructure-decorated extrinsic semiconductor interfaces modified through in situ nitridation greatly expand the range of sensor interface response. Select metal-oxide sites, deposited to an n-type nanopore-coated microporous interface, direct a dominant electron-transduction process for reversible chemical sensing, which minimizes chemical-bond formation. The oxides are modified to decrease their Lewis acidity through a weak interaction to form metal oxynitride sites. Conductometric and X-ray photoelectron spectroscopy measurements demonstrate that in situ treatment changes the reversible interaction with the analytes NH3 and NO. The sensor range is extended, which creates a distinct new family of responses determined by the Lewis acidity/basicity of a given analyte relative to that of the nanostructures chosen to decorate the interface. The analyte response, broadened in a substantial and predictable way by nitridation, is explained by the recently developing inverse hard/soft acid/base model (IHSAB) of reversible electron transduction.

Nanostructure-Directed Chemical Sensing: The IHSAB Principle and the Effect of Nitrogen and Sulfur Functionalization on Metal Oxide Decorated Interface Response.

The response matrix, as metal oxide nanostructure decorated n-type semiconductor interfaces are modified in situ through direct amination and through treatment with organic sulfides and thiols, is demonstrated. Nanostructured TiO2, SnOx, NiO and CuxO (x = 1,2), in order of decreasing Lewis acidity, are deposited to a porous silicon interface to direct a dominant electron transduction process for reversible chemical sensing in the absence of significant chemical bond formation. The metal oxide sensing sites can be modified to decrease their Lewis acidity in a process appearing to substitute nitrogen or sulfur, providing a weak interaction to form the oxynitrides and oxysulfides. Treatment with triethylamine and diethyl sulfide decreases the Lewis acidity of the metal oxide sites. Treatment with acidic ethane thiol modifies the sensor response in an opposite sense, suggesting that there are thiol (SH) groups present on the surface that provide a Brønsted acidity to the surface. The in situ modification of the metal oxides deposited to the interface changes the reversible interaction with the analytes, NH3 and NO. The observed change for either the more basic oxynitrides or oxysulfides or the apparent Brønsted acid sites produced from the interaction of the thiols do not represent a simple increase in surface basicity or acidity, but appear to involve a change in molecular electronic structure, which is well explained using the recently developed inverse hard and soft acids and bases (IHSAB) model.