Selected Biomarkers Revealed Potential Skin Toxicity Caused by Certain Copper Compounds.

Copper is an essential mineral and plays important roles in skin growth and activity. Copper delivery through skin can provide beneficial effects but its potential to induce skin irritation reactions is often overlooked. Data on dermal toxicity caused by copper compounds is scant. Some recognized in vitro skin toxicity methods are unsuitable for all metal compounds. Here, we employ a keratinocyte-based model and evaluated the skin irritation potential of copper compounds at cellular, genomic and proteomic levels. We determined cell viability and cytotoxicity by using tetrazolium reduction assay and Lactate Dehydrogenase (LDH) assay, performed real-time PCR and protein quantification to assess the expression of biomarkers after treating cells with copper peptide (GHK-Cu), copper chloride (CuCl2) and copper acetate (Cu(OAc)2). These copper compounds exhibited different irritancy potentials at the same treatment concentrations. GHK-Cu was not cytotoxic and did not induce any significant change in the expression levels of various skin irritation-related biomarkers. IL-1α and IL-8, HSPA1A and FOSL1 were significantly upregulated following 24-h treatment with CuCl2 and Cu(OAc)2 at 58 and 580 µM without concomitant inhibition in cell viability. GHK-Cu has a low potential of inducing skin irritation and therefore provides a safer alternative for the delivery of copper through skin.

Microneedle-Mediated Delivery of Copper Peptide Through Skin.

PURPOSE: Copper peptide (GHK-Cu) plays an important role in skin regeneration and wound healing. However, its skin absorption remains challenging due to its hydrophilicity. Here we use polymeric microneedle array to pre-treat skin to enhance GHK-Cu skin penetration. METHODS: Two in vitro skin models were used to assess the capability of microneedles in facilitating skin delivery of GHK-Cu. Histological assay and confocal laser scanning microscopy were performed to characterize and quantify the microconduits created by the microneedles inside skin. Cellular and porcine models were used to evaluate the safety of microneedle-assisted copper peptide delivery. RESULTS: The depth and percentage of microneedle penetration were correlated with application forces, which in turn influenced the extent of enhancement in the skin permeability of GHK-Cu. In 9 h, 134 ± 12 nanomoles of peptide and 705 ± 84 nanomoles of copper permeated though the microneedle treated human skin, while almost no peptide or copper permeated through intact human skin. No obvious signs of skin irritation were observed with the use of GHK-Cu after microneedle pretreatment. CONCLUSIONS: It is effective and safe to enhance the skin permeation of GHK-Cu by using microneedles. This approach may be useful to deliver similar peptides or minerals through skin.

Resist free patterning of nonpreferential buffer layers for block copolymer lithography.

We report the design of a direct electron beam patternable buffer layer to spatially control the orientation of the microdomains in an overlaying polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) block copolymer (BCP) film. The buffer layer consists of a surface anchored low molecular weight PS-b-PMMA, with the PMMA segment anchored to the surface and a short PS block at the buffer layer/BCP interface. The block architecture of the buffer layer combines the essential features of "bottom up" and "top down" approaches as it functions as a nonpreferential layer to dictate perpendicular orientation of BCP domains from the substrate interface and as an e-beam resist to allow top-down lithographic process to spatially define the buffer layer on the substrate. The composition of the buffer layer can be tuned by changing the relative block lengths to create a nonpreferential surface which effectively induces perpendicular orientation of domains in an overlying BCP film. The grafted block copolymer can be locally shaved by e-beam lithography resulting in spatial control of domain orientation in the BCP film. The direct patterning approach reduces the number of steps involved in forming chemical patterns by conventional lithography.

One-Step Direct-Patterning Template Utilizing Self-Assembly of POSS-Containing Block Copolymers.

We report the self-assembly of organic-inorganic block copolymers (BCP) in thin-films by simple solvent annealing on unmodified substrates. The resulting vertically oriented lamellae and cylinders are converted to a hard silica mask by a single step highly selective oxygen plasma etching. The size of the resulting nanostructures in the case of cylinders is less than 10 nm.

Effect of rubbing-induced polymer chain alignment on adhesion and friction of glassy polystyrene surfaces.

The friction and adhesion properties of polystyrene surfaces are studied below the glass transition temperature by means of atomic force microscopy in argon. Even at a temperature far below the glass transition, the repeated sliding of a polystyrene bead tip on the non-cross-linked polystyrene surface causes significant reduction of friction and adhesion forces. There is no measurable wear of the polystyrene surface due to repeated sliding. These decreases are associated with the alignment of the outermost polymer segments induced by repeated rubbing. There are only little changes in friction and adhesion on the cross-linked polystyrene surface in which the covalent cross-linking prevents chain realignment.