Cooperativity of silanol defect chemistry in zeolites.

Deboronation treatment of zeolite B-SSZ-55 can generate vacancy defects consisting of four silanol groups (silanol nests). However, 1H solid-state NMR spectroscopy indicates the prevalence of two silanol groups (silanol dyads) instead of four silanol groups. Such silanol dyads must be formed by the silanol condensation of two silanol groups at the silanol nests. Yet, the exact mechanism of this condensation and detailed structure of the silanol defect are not known. Here, the structure and formation mechanism of silanol dyads in the SSZ-55 zeolite have been investigated by both cluster and periodic density functional theory calculations. The calculated 1H NMR chemical shifts agree with the experimental values, showing that the silanol dyads are indeed commonly present at the vacancies and the vacancy density plays a role in the relaxation of the zeolite framework. The nature (size) of the silanol clusters influences their acidity.

Insight into on-wafer crystallization of pure-silica-zeolite films through nutrient replenishment.

Tetraethylorthosilicate (TEOS) is added to a pure-silica-zeolite MEL nanoparticle suspension and the mixture is subsequently used for preparing spin-on low-dielectric constant (low-k) films. The films are then characterized by ellipsometric porosimetry, transmission electron microscopy (TEM), and nanoindentation. Investigation into the film microstructure indicates that the addition of TEOS significantly increases the fraction of the crystalline domains, decreases the inter-crystal mesopore size, and narrows the pore size distribution. Films with 12% TEOS loading have a mean pore size distribution centered at 3.5 nm (diameter) with a full width at half maximum (fwhm) of 0.8 nm, while those with no TEOS have a distribution at 11.1 nm and fwhm of 7.9 nm. At 12% TEOS loading, the reduced modulus and hardness are 11.0 and 1.12 GPa, respectively; without TEOS, the values are 6.4 and 0.57 GPa.

Zeolite thin films: from computer chips to space stations.

Zeolites are a class of crystalline oxides that have uniform and molecular-sized pores (3-12 A in diameter). Although natural zeolites were first discovered in 1756, significant commercial development did not begin until the 1950s when synthetic zeolites with high purity and controlled chemical composition became available. Since then, major commercial applications of zeolites have been limited to catalysis, adsorption, and ion exchange, all using zeolites in powder form. Although researchers have widely investigated zeolite thin films within the last 15 years, most of these studies were motivated by the potential application of these materials as separation membranes and membrane reactors. In the last decade, we have recognized and demonstrated that zeolite thin films can have new, diverse, and economically significant applications that others had not previously considered. In this Account, we highlight our work on the development of zeolite thin films as low-dielectric constant (low-k) insulators for future generation computer chips, environmentally benign corrosion-resistant coatings for aerospace alloys, and hydrophilic and microbiocidal coatings for gravity-independent water separation in space stations. Although these three applications might not seem directly related, they all rely on the ability to fine-tune important macroscopic properties of zeolites by changing their ratio of silicon to aluminum. For example, pure-silica zeolites (PSZs, Si/Al = infinity) are hydrophobic, acid stable, and have no ion exchange capacity, while low-silica zeolites (LSZs, Si/Al < 2) are hydrophilic, acid soluble, and have a high ion exchange capacity. These new thin films also take advantage of some unique properties of zeolites that have not been exploited before, such as a higher elastic modulus, hardness, and heat conductivity than those of amorphous porous silicas, and microbiocidal capabilities derived from their ion exchange capacities. Finally, we briefly discuss our more recent work on polycrystalline zeolite thin films as promising biocompatible coatings and environmentally benign wear-resistant and antifouling coatings. When zeolites are incorporated into polymer thin films in the form of nanocrystals, we also show that the resultant composite membranes can significantly improve the performance of reverse osmosis membranes for sea water desalination and proton exchange membrane fuel cells. These diverse applications of zeolites have the potential to initiate new industries while revolutionizing existing ones with a potential economic impact that could extend into the hundreds of billions of dollars. We have licensed several of these inventions to companies with millions of dollars invested in their commercial development. We expect that other related technologies will be licensed in the near future.

On-wafer crystallization of ultralow-kappa pure silica zeolite films.

A higher goal: An on-wafer crystallization process to prepare pure silica zeolite (PSZ) MEL-type films that is superior to the previously used hydrothermal process is reported. These striation-free MEL-type films (right, see picture) outperform the traditional spin-on films (left) in terms of the kappa value, mechanical properties, surface roughness, mesopore size, and size distribution.

Hydrofluoric-acid-resistant and hydrophobic pure-silica-zeolite MEL low-dielectric-constant films.

A new technique for the silylation of pure-silica-zeolite MEL low-k films has been developed in which the spin-on films are calcined directly in trimethylchlorosilane or 1,1,1,3,3,3-hexamethyldisilazane (HMDS) in order to protect the films against corrosive wet etch chemicals and ambient moisture adsorption. In an alternative procedure, HMDS is also added to the zeolite suspension before film preparation. Fourier transform infrared spectroscopy, X-ray photoelectron spectroscopy, water-soak tests, and HF etch tests are performed to characterize the films. The dielectric constant is as low as 1.51, and the films resist HF attack up to 5.5 min. These properties are highly desirable by the semiconductor industry for next-generation microprocessors.

Pure-silica-zeolite MEL low-k films from nanoparticle suspensions.

Following our previous works on pure-silica-zeolite (PSZ) MFI, in this study we explore PSZ MEL as a new option for low-k dielectric films. Our motivation has been to increase the microporosity of the spin-on films by moving to structures with a framework density (FD) lower than MFI. Nanoparticle PSZ MEL suspensions were synthesized by a two-stage method that allowed the yield of nanocrystals to be significantly enhanced, while the zeolite nanocrystals remain small. For the first time zeolite nanocrystals of about 50 nm were synthesized with a yield as high as 57%. Nanoparticle suspensions with different particle sizes and crystallinities were spun on silicon wafers to prepare continuous thin films. An ultralow-k value as low as 1.5 was obtained with MEL nanoparticle suspension of high relative crystallinity. The surface roughness of the PSZ MEL film with high relative crystallinity is greatly improved (R(rms) approximately 5.6 nm) compared to MFI films with high relative crystallinity (R(rms) approximately 12 nm).