Performance limit of all-wrapped monolayer MoS2 transistors.

All-wrapped transistors consisting of two-dimensional transition-metal dichalcogenide channels are appealing candidates for post-silicon electronics. Based on the Boltzmann transport theory, here we report a comprehensive theoretical survey on the performance limits for monolayer MoS2 transistors with three prototypical gate dielectrics (Al2O3, HfO2 and BN), by including primary extrinsic charge scattering mechanisms present in practical devices. A concept of "dead space" between the dielectrics and channels is proposed and used in calculation to ameliorate the general overestimation in scattering intensity of surface optical phonons, which enables an accurate description of electronic transport behavior. Crucial device indices, including charge mobility and current density, are thoroughly analyzed for transistors at post-silicon technological nodes beyond 1 nm. The on-state current is estimated to be generally greater than 2 mA µm-1 at channel lengths below 10 nm. The results clarify the potential benefits in performance from extremely miniaturized monolayer-channel transistors for More-Moore electronics.

Lattice Vacancy Induced Energy Renormalization of Photonic Quasiparticles in Two-Dimensional Semiconductors.

Coulomb interactions among dense charges and quasiparticle energy renormalization are at the center of quantum science because they significantly reshape the fundamental electronic and photonic properties of materials. While lattice vacancies are ubiquitous in solid materials, their physical effect on the Coulomb interaction among quasiparticles is normally weak and negligible. Here we show that in atomically thin semiconductors the presence of lattice vacancies emerges as an important but unexplored origin for the nontrivial renormalization of quasiparticle binding energies, due to the subtle modification of overall dielectric functions at low dimensionality. Such a renormalization effect leads to unusual reduction in the energy scales of photonic quasiparticles and red shifts of photoluminescence as the density of lattice vacancies increases. With strict configurative form factors derived, a dielectric screening model is also established for the generalized trilayer systems to capture the fine modification in the energy scales of quasiparticles and to elucidate the dielectric functions versus realistic Bohr lengths. This finding highlights the essential but commonly neglected role of lattice vacancies and deciphers the longstanding enigma of unpredictable photoluminescent line shifts in low-dimensional systems.

Coulomb Screening and Scattering in Atomically Thin Transistors across Dimensional Crossover.

Layered two-dimensional dichalcogenides are potential candidates for post-silicon electronics. Here, we report insightfully experimental and theoretical studies on the fundamental Coulomb screening and scattering effects in these correlated systems, in response to the changes of three crucial Coulomb factors, including electric permittivity, interaction distance, and density of Coulomb impurities. We systematically collect and analyze the trends of electron mobility with respect to the above factors, realized by synergic modulations on channel thicknesses and gating modes in dual-gated MoS2 transistors with asymmetric dielectric cleanliness. Strict configurative form factors are developed to capture the subtle parametric changes across dimensional crossover. A full diagram of the carrier scattering mechanisms, in particular on the pronounced Coulomb scattering, is unfolded. Moreover, we clarify the presence of up to 40% discrepancy in mobility by considering the permittivity modification across dimensional crossover. The understanding is useful for exploiting atomically thin body transistors for advanced electronics.

Clean BN-Encapsulated 2D FETs with Lithography-Compatible Contacts.

Device passivation through ultraclean hexagonal BN encapsulation has proven to be one of the most effective ways of constructing high-quality devices with atomically thin semiconductors that preserve the ultraclean interface quality and intrinsic charge transport behavior. However, it remains challenging to integrate lithography-compatible contact electrodes with flexible distributions and patterns. Here, we report the feasibility of a straightforward integration of lithography-defined contacts into BN-encapsulated two-dimensional field-effect transistors (2D FETs), giving rise to overall device quality comparable to the state-of-the-art results from the painstaking pure dry transfer processing. The electronic characterization of FETs consisting of WSe2 and MoS2 channels reveals an extremely low scanning hysteresis of ∼2 mV on average, a low density of interfacial charged impurities of ∼1011 cm-2, and generally high charge mobilities over 1000 cm2 V-1 s-1 at low temperatures. The overall high device qualities verify the viability of directly integrating lithography-defined contacts into BN-encapsulated devices to exploit their intrinsic charge transport properties for advanced electronics.