A Novel Ultra-Low Work Function TbFx for High Efficiency Dopant-Free Silicon Solar Cells.

The ability of carrier selective contact is mainly determined by the surface passivation and work function for dopant-free materials applied in crystalline silicon (c-Si) solar cells, which have received considerable attention in recent years. In this contribution, a novel electron-selective material, lanthanide terbium trifluoride (TbFx ), with an ultra-low work function of 2.4 eV characteristic, is presented, allowing a low contact resistivity (ρc ) of ≈3 mΩ cm2 . Additionally, the insertion of ultrathin passivated SiOx layer deposited by PECVD between TbFx and n-Si resulted in ρc only increase slightly. SiOx /TbFx stack eliminated fermi pinning between aluminum and n-type c-Si (n-Si), which further enhanced the electron selectivity of TbFx on full-area contacts to n-Si. Last, SiOx /TbFx /Al electron-selective contacts significantly improves the open circuit voltage (Voc ) for silicon solar cells, but rarely impacts the short circuit current (Jsc ) and fill factor (FF), thus champion efficiency cell achieved approaching 22% power conversion efficiency (PCE). This study indicates a great potential for using lanthanide fluorides as electron-selective material in photovoltaic devices.

Quantifying Efficiency Limitations in All-Inorganic Halide Perovskite Solar Cells.

While halide perovskites have excellent optoelectronic properties, their poor stability is a major obstacle toward commercialization. There is a strong interest to move away from organic A-site cations such as methylammonium and formamidinium toward Cs with the aim of improving thermal stability of the perovskite layers. While the optoelectronic properties and the device performance of Cs-based all-inorganic lead-halide perovskites are very good, they are still trailing behind those of perovskites that use organic cations. Here, the state-of-the-art of all-inorganic perovskites for photovoltaic applications is reviewed by performing detailed meta-analyses of key performance parameters on the cell and material level. Key material properties such as carrier mobilities, external photoluminescence quantum efficiency, and photoluminescence lifetime are discussed and what is known about defect tolerance in all-inorganic is compared relative to hybrid (organic-inorganic) perovskites. Subsequently, a unified approach is adopted for analyzing performance losses in perovskite solar cells based on breaking down the losses into several figures of merit representing recombination losses, resistive losses, and optical losses. Based on this detailed loss analysis, guidelines are eventually developed for future performance improvement of all-inorganic perovskite solar cells.

Development of Conductive SiCx:H as a New Hydrogenation Technique for Tunnel Oxide Passivating Contacts.

Conductive hydrogenated silicon carbide (SiCx:H) is discovered as a promising hydrogenation material for tunnel oxide passivating contacts (TOPCon) solar cells. The proposed SiCx:H layer enables a good passivation quality and features a good electrical conductivity, which eliminates the need of etching back of SiNx:H and indium tin oxide (ITO)/Ag deposition for metallization and reduces the number of process steps. The SiCx:H is deposited by hot wire chemical vapor deposition (HWCVD) and the filament temperature (Tf) during deposition is systematically investigated. Via tuning the SiCx:H layer, implied open-circuit voltages (iVoc) up to 742 ± 0.5 mV and a contact resistivity (ρc) of 21.1 ± 5.4 mΩ·cm2 is achieved using SiCx:H on top of poly-Si(n)/SiOx/c-Si(n) stack at Tf of 2000 °C. Electrochemical capacitance-voltage (ECV) and secondary ion mass spectrometry (SIMS) measurements were conducted to investigate the passivation mechanism. Results show that the hydrogenation at the SiOx/c-Si(n) interface is responsible for the high passivation quality. To assess its validity, the TOPCon stack was incorporated as rear electron selective-contact in a proof-of-concept n-type solar cells featuring ITO/a-Si:H(p)/a-Si:H(i) as front hole selective-contact, which demonstrates a conversion efficiency up to 21.4%, a noticeable open-circuit voltage (Voc) of 724 mV and a fill factor (FF) of 80%.

Conductive Cuprous Iodide Hole-Selective Contacts with Thermal and Ambient Stability for Silicon Solar Cells.

Dopant-free carrier-selective contacts are becoming increasingly attractive for application in silicon solar cells because of the depositions for their fabrication being simpler and occurring at lower temperatures. However, these contacts are limited by poor thermal and environmental stability. In this contribution, the use of the conductive high work function of cuprous iodide, with its characteristic thermal and ambient stability, has enabled a hole-selective contact for p-type silicon solar cells because of the large conduction band offset and small valence offset at the CuI/p-Si interface. The contact resistivity (≈30 mΩ·cm2) of the Ag/CuI (20 nm)/p-Si contact after annealing to 200 °C represents the CuI-based hole-selective contact with low resistance and high thermal stability. Microscopic images and elemental mapping of the Ag/CuI/p-Si contact interface revealed that a nonuniform, continuous CuI layer separates the Ag electrode and p-type Si. Thermal treatment at 200 °C results in the intermixing of the Ag and CuI layers. As a result, the 200 °C thermal process improves the efficiency (20.7%) and stability of the p-Si solar cells featuring partial CuI hole-selective contact. Furthermore, the devices employing the CuI/Ag contact are thermally stable upon annealing to temperatures up to 350 °C. These results not only demonstrate the use of metal iodide instead of metal oxides as hole-selective contacts for efficient silicon solar cells but also have important implications regarding industrial feasibility and longevity for deployment in the field.

Chromium Trioxide Hole-Selective Heterocontacts for Silicon Solar Cells.

A high recombination rate and high thermal budget for aluminum (Al) back surface field are found in the industrial p-type silicon solar cells. Direct metallization on lightly doped p-type silicon, however, exhibits a large Schottky barrier for the holes on the silicon surface because of Fermi-level pinning effect. As a result, low-temperature-deposited, dopant-free chromium trioxide (CrO x, x < 3) with high stability and high performance is first applied in a p-type silicon solar cell as a hole-selective contact at the rear surface. By using 4 nm CrO x between the p-type silicon and Ag, we achieve a reduction of the contact resistivity for the contact of Ag directly on p-type silicon. For further improvement, we utilize a CrO x (2 nm)/Ag (30 nm)/CrO x (2 nm) multilayer film on the contact between Ag and p-type crystalline silicon (c-Si) to achieve a lower contact resistance (40 mΩ·cm2). The low-resistivity Ohmic contact is attributed to the high work function of the uniform CrO x film and the depinning of the Fermi level of the SiO x layer at the silicon interface. Implementing the advanced hole-selective contacts with CrO x/Ag/CrO x on the p-type silicon solar cell results in a power conversion efficiency of 20.3%, which is 0.1% higher than that of the cell utilizing 4 nm CrO x. Compared with the commercialized p-type solar cell, the novel CrO x-based hole-selective transport material opens up a new possibility for c-Si solar cells using high-efficiency, low-temperature, and dopant-free deposition techniques.