Muonium emission into vacuum from mesoporous thin films at cryogenic temperatures.

We report on muonium (Mu) emission into vacuum following µ(+) implantation in mesoporous thin SiO(2) films. We obtain a yield of Mu into vacuum of (38±4)% at 250 K and (20±4)% at 100 K for 5 keV µ(+) implantation energy. From the implantation energy dependence of the Mu vacuum yield we determine the Mu diffusion constants in these films: D(Mu)(250 K)=(1.6±0.1)×10(-4) cm(2)/s and D(Mu)(100 K)=(4.2±0.5)×10(-5) cm(2)/s. Describing the diffusion process as quantum mechanical tunneling from pore to pore, we reproduce the measured temperature dependence ∼T(3/2) of the diffusion constant. We extract a potential barrier of (-0.3±0.1) eV which is consistent with our computed Mu work function in SiO(2) of [-0.3,-0.9] eV. The high Mu vacuum yield, even at low temperatures, represents an important step toward next generation Mu spectroscopy experiments.

Vacancy defects as compensating centers in Mg-doped GaN.

We apply positron annihilation spectroscopy to identify V(N)-Mg(Ga) complexes as native defects in Mg-doped GaN. These defects dissociate in postgrowth annealings at 500-800 degrees C. We conclude that V(N)-Mg(Ga) complexes contribute to the electrical compensation of Mg as well as the activation of p-type conductivity in the annealing. The observation of V(N)-Mg(Ga) complexes confirms that vacancy defects in either the N or Ga sublattice are abundant in GaN at any position of the Fermi level during growth, as predicted previously by theoretical calculations.