ABSTRACT
A comparative study of anticorrosive inhibited polymer films on the tungsten surface formed from an aqueous solution of inhibited formulations (INFOR) containing organosilane and corrosion inhibitors was carried out by means of the prolonged exposure of a tungsten product in a modifying solution and by the method of cataphoretic deposition (CPD). Depending on the method of forming films on tungsten, the molecular organization of the near-surface layers was studied (ATR-FTIR), and the subprimary structure of the films was explored (TEM). The optimal modes of cataphoresis deposition (CPD duration and current density applied to the sample) for the formation of a protective inhibited polymer film on the tungsten surface were established by means of SEM. The energy and thermochemical characteristics (sessile drop and DSC methods), as well as operational (adhesive behavior) and protective filming ability (EIS and corrosion behavior), according to the method of formation of inhibited polymer film, were determined. Based on the combined characteristics of the films obtained by the two methods and the deposition modes, the CPD method showed better performance than the electroless dipping method.
Subject(s)
Polymers , Tungsten , Polymers/chemistry , Tungsten/chemistry , Drug Compounding , Motion PicturesABSTRACT
Single crystal diamond tips with perfect pyramidal geometry were obtained by a combination of chemical vapor deposition and selective oxidation of polycrystalline films. The parameters of the deposition process were chosen to provide growth of a textured film consisting of micrometer sized diamond crystallites embedded into nanodiamond ballas-like material. The heating of the film in an air environment was used for selective oxidation of the nanodiamond component. The films obtained contain free standing pyramidal single crystal diamond tips oriented by their apexes to the substrate surface. The tips were used for the fabrication of atomic force microscopy probes and their evaluation in comparison to common silicon probes.
