Transparent conductive grids via direct writing of silver nanoparticle inks.

Transparent conductive grids are patterned by direct writing of concentrated silver nanoparticle inks. This maskless, etch-free patterning approach is used to produce well-defined, two-dimensional periodic arrays composed of conductive features with center-to-center separation distances of up to 400 µm and an optical transmittance as high as 94.1%.

Direct-write assembly of microperiodic planar and spanning ITO microelectrodes.

Printed Sn-doped In(2)O(3) (ITO) microelectrodes are fabricated by direct-write assembly of sol-gel inks with varying concentration. This maskless, non-lithographic approach provides a facile route to patterning transparent conductive features in planar arrays and spanning architectures.