Holographic fabrication of graded photonic super-quasi-crystals with multiple-level gradients.

Photonic quasi-crystals and photonic crystals with certain degrees of disorder can have a broadband light-matter interaction. In this paper, we present the holographic fabrication of graded photonic super-quasi-crystals through pixel-by-pixel phase pattern engineering using a spatial light modulator. Using the same phase pattern arranged in a decagon, we have fabricated graded photonic super-quasi-crystals with five-fold symmetry and multiple levels of gradients and graded photonic super-crystals with rectangular unit super-cells, depending on the Fourier filter. Although a certain degree of disorder was incorporated in the quasi-crystals, we still observed the golden ratio in the diameters of the diffraction rings of the fabricated quasi-crystals, indicating five-fold symmetry. Using direct pixel-by-pixel phase engineering, the same laser projection system, consisting of an integrated spatial light modulator and a reflective optical element, can be used for the fabrication of graded photonic super-crystals with various symmetries. The multi-level gradient effects on the optical properties of an organic light-emitting diode were simulated. When the cathode of an organic light-emitting device is patterned in the graded photonic super-crystals, a light extraction efficiency up to 76% in the visible range can be achieved.

Flexible Holographic Fabrication of 3D Photonic Crystal Templates with Polarization Control through a 3D Printed Reflective Optical Element.

In this paper, we have systematically studied the holographic fabrication of three-dimensional (3D) structures using a single 3D printed reflective optical element (ROE), taking advantage of the ease of design and 3D printing of the ROE. The reflective surface was setup at non-Brewster angles to reflect both s- and p-polarized beams for the interference. The wide selection of reflective surface materials and interference angles allow control of the ratio of s- and p-polarizations, and intensity ratio of side-beam to central beam for interference lithography. Photonic bandgap simulations have also indicated that both s and p-polarized waves are sometimes needed in the reflected side beams for maximum photonic bandgap size and certain filling fractions of dielectric inside the photonic crystals. The flexibility of single ROE and single exposure based holographic fabrication of 3D structures was demonstrated with reflective surfaces of ROEs at non-Brewster angles, highlighting the capability of the ROE technique of producing umbrella configurations of side beams with arbitrary angles and polarizations and paving the way for the rapid throughput of various photonic crystal templates.

Holographic Fabrication of Designed Functional Defect Lines in Photonic Crystal Lattice Using a Spatial Light Modulator.

We report the holographic fabrication of designed defect lines in photonic crystal lattices through phase engineering using a spatial light modulator (SLM). The diffracted beams from the SLM not only carry the defect's content but also the defect related phase-shifting information. The phase-shifting induced lattice shifting in photonic lattices around the defects in three-beam interference is less than the one produced by five-beam interference due to the alternating shifting in lattice in three beam interference. By designing the defect line at a 45 degree orientation and using three-beam interference, the defect orientation can be aligned with the background photonic lattice, and the shifting is only in one side of the defect line, in agreement with the theory. Finally, a new design for the integration of functional defect lines in a background phase pattern reduces the relative phase shift of the defect and utilizes the different diffraction efficiency between the defect line and background phase pattern. We demonstrate that the desired and functional defect lattice can be registered into the background lattice through the direct imaging of designed phase patterns.

Registering functional defects into periodic holographic structures.

In this paper, we present two methods for registering desired defect lattices within background periodic lattices through spatial light-modulator-based holographic lithography. In the first method, the diffraction efficiency from the engineered phase pattern was used to locally modify the fill fraction of polymerized materials in holographic structures, and, at the same time, we achieved the lattice matching between modified and background regions. In the second method, we registered spatially variant lattices for a 90 deg bend within the background periodic lattices through two steps of phase engineering of the laser beam.