Theoretical modeling of ice lithography on amorphous solid water.

Due to the perfection of the nanofabrication in nanotechnology and nanoscience, ice lithography (IL) by patterning ice thin-films with a focused electron beam, as a significant derivative technology of electron beam lithography (EBL), is attracting growing attention, evoked by its advantages over traditional EBL with respects of in situ-fabrication, high efficiency, high accuracy, limited proximity effect, three-dimensional (3D) profiling capability, etc. However, theoretical modeling of ice lithography for replicated profiles on the ice resist (amorphous solid water, ASW) has rarely been reported so far. As the result, the development of ice lithography still stays at the experimental stage. The shortage of modeling methods limits our insight into the ice lithography capability, as well as theoretical anticipations for future developments of this emerging technique. In this work, an e-beam induced etching ice model based on the Monte Carlo algorithm for point/line spread functions is established to calculate the replicated profiles of the resist by ice lithography. To testify the fidelity of the modeling method, systematic simulations of the ice lithography property under the processing parameters of the resist thickness, electron accelerating voltage and actual patterns are performed. Theoretical comparisons between the IL on ASW and the conventional EBL on polymethyl methacrylate (PMMA) show superior properties of IL over EBL in terms of the minimum feature size, the highest aspect ratio, 3D nanostructure/devices, etc. The success in developing a modeling method for ice lithography, as reported in this paper, offers a powerful tool in characterizing ice lithography up to the theoretical level and down to molecular scales.

Spectral filter in short-wave infrareds based on a metasurface on silicon-on-insulator with polarizing bandpass.

Spectral filters with polarimetric character in short-wave infrareds are urgently needed because of their broad applications in optic-fiber communications, polarimetric detections, and imaging. Based on our earlier progress in developing polarimetric devices in infrared wavelengths, in this work, a plasmonic-metasurface-based polarization-dependency multi-channel narrowband filter in short-wave infrareds was developed. To meet the requirement by the developing trend of polarimetric detection/spectral imaging in short-wave infrareds, a resonant cavity in the form of the Au hat/elliptical Si/SiO2 pillars/Au layer as the filters was proposed. Numerical simulations by finite-difference time-domain (FDTD) show resonant and polarized transmissions of the designed devices to infrared light in short wavelengths, and the peak positions are relevant to the structural dimensions. Optical characteristics of the filters, fabricated by electron beam lithography/dry-etch technique, agree well with the simulated behavior. To enhance the transmission efficiency to the applicable level, nanoprocessing of the filters still needs to be optimized. Nevertheless, the progress reported is promising for this new type of spectral filters based on modern metasurfaces.

Optimization study of metallic hole arrays as the multi-channel spectral filters in long-infrared wavelengths.

The development of miniaturized multi-channel infrared filters based on plasmonic metasurfaces is attracting growing attention, driven by its potential applications in infrared imaging, photodetectors, and spectroscopy. However, the advance of such filters in long-infrared wavelengths has rarely been reported. This paper reports our recent progress on developing multi-channel spectral filters based on micrometer metallic hole arrays in the long-infrared band of 10-15 µm. The effects of structural parameters and the shapes of metallic hole arrays on filtering performance are investigated by numerical simulations with the finite-difference time-domain method and then experimentally verified by optical characterizations of fabricated filters using electron beam lithography. The transmission peaks of the filter on a zinc selenide substrate were optimized with a maximum transmittance of 63%. A comparison of the hole shapes shows that elliptical holes give rise to sharper transmission peak quality than round ones by 28%. The progress achieved in this work should be a promising step in the development of metallic hole-based spectral filters with miniaturized dimensions.

Optimization study of metallic sub-wavelength gratings as the polarizer in infrared wavelengths.

Despite the polarimetric detection in the infrared wavelengths of 8-10 µm being of great importance and broad applications, there has been limited addressing of the grating-based polarizers in this band. One of the main issues lies in the process incompatibility between the conventional nanofabrication technique and the II-VI materials such as HgCdTe, so that the direct integration of polarizers with sensors still remains a big challenge. This paper reports our recent work on optimizing the grating structures, materials, and nanofabrication processes for enhancing both the transmittance and the extinction ratio of polarizers on Si and/or ZnSe wafers, using numerical simulations for the grating design and electron beam lithography for the nanoscale pattern generation. By utilizing the finite-difference time-domain method, both the transmittance and the extinction ratio are maximized by optimizing the grating geometric dimensions and the duty cycle for two different grating materials of Al and Au for comparison. Based on the designed structures, nanofabrications of sub-wavelength gratings in both Al and Au are carried out, and the processes are compared for achieving high polarization performance. Optical characterizations of the fabricated polarizers demonstrate that both high transmittance and extinction ratio can be achieved in feasible parameters and the nano-process developed in this work.

Achieving Infrared Detection by All-Si Plasmonic Hot-Electron Detectors with High Detectivity.

An improved architecture for all-Si based photoelectronic detectors has been developed, consisting of a specially designed metasurface as the antenna integrated into a Si nanowire array on the insulator by an electron beam lithography based self-alignment process. Simulation using the Finite Difference Time Domain (FDTD) method was carried out to ensure perfect absorption of light by the detector. Optic measurement shows a 90% absorption at 1.05 µm. Photoelectronic characterization demonstrates the responsivity and detectivity as high as 94.5 mA/W and 4.38 × 1011 cm Hz1/2/W, respectively, at 1.15 µm with the bandwidth of 480 nm, which is comparable to that of III-V/II-VI compound detectors. It is understood that the outstanding performances over other reported all-Si based detectors originate from the enhanced quantum efficiency in one-dimensional conduction channels with high density of states, which efficiently accommodate the emitted plasmonic hot electrons for high conduction in the Si nanowires, enabling the near-infrared detection by all-Si based detectors.

All-Si Photodetectors with a Resonant Cavity for Near-Infrared Polarimetric Detection.

This work developed an all-Si photodetector with a surface plasmonic resonator formed by a sub-wavelength Au grating on the top of a Si-nanowire array and the same one beside the wires. The Au/Si interface with a Schottky barrier allows the photo-electron detection in near-infrared wavelength based on the internal emission of hot electrons generated by the surface plasmons in the cavity. Meanwhile, the Au sub-wavelength grating on the Si nanowire array acts as a polarizer for polarimetric detection. Finite-difference time-domain method was applied in the design of the novel device and state-of-art nanofabrication based on electron beam lithography was carried out. The characterization of the photo-electronic properties as well as the polarimetric detection demonstrate that the fabricated detectors on the silicon substrate possesses great prospects for sensing technology on all-Si.

Reconstructing a plasmonic metasurface for a broadband high-efficiency optical vortex in the visible frequency.

Metasurfaces consisting of a two-dimensional metallic nano-antenna array are capable of transferring a Gaussian beam into an optical vortex with a helical phase front and a phase singularity by manipulating the polarization/phase status of light. This miniaturizes a laboratory scaled optical system into a wafer scale component, opening up a new area for broad applications in optics. However, the low conversion efficiency to generate a vortex beam from circularly polarized light hinders further development. This paper reports our recent success in improving the efficiency over a broad waveband at the visible frequency compared with the existing work. The choice of material, the geometry and the spatial organization of meta-atoms, and the fabrication fidelity are theoretically investigated by the Jones matrix method. The theoretical conversion efficiency over 40% in the visible wavelength range is worked out by systematic calculation using the finite difference time domain (FDTD) method. The fabricated metasurface based on the parameters by theoretical optimization demonstrates a high quality vortex in optical frequencies with a significantly enhanced efficiency of over 20% in a broad waveband.

High-resolution plasmonic structural colors from nanohole arrays with bottom metal disks.

We present transmissive plasmonic structural colors from subwavelength nanohole arrays with bottom metal disks for scaled-up manufacturing by nanoimprint lithography (NIL). Comprehensive theoretical and experimental studies are carried out to understand the specific extraordinary optical transmission behavior of the structures with such bottom metal disks. Distinctive colors covering the entire visible spectrum can be generated by changing the structural dimensions of hole arrays in Ag covered by the metal disks. The plasmonic energy hybridization theory is applied to explain the unstable color output with shallow holes so that a large processing window during NIL could be achieved for mass production. A high-resolution of 127,000 dots per inch is demonstrated with potential applications, including color filters and displays, high-resolution color printing, CMOS color imaging, and anti-counterfeiting.

Lithographically-generated 3D lamella layers and their structural color.

Inspired by the structural color from the multilayer nanophotonic structures in Morpho butterfly wing scales, 3D lamellae layers in dielectric polymers (polymethyl methacrylate, PMMA) with n ∼ 1.5 were designed and fabricated by standard top-down electron beam lithography with one-step exposure followed by an alternating development/dissolution process of PMMA/LOR (lift-off resist) multilayers. This work offers direct proof of the structural blue/green color via lithographically-replicated PMMA/air multilayers, analogous to those in real Morpho butterfly wings. The success of nanolithography in this work for the 3D lamellae structures in dielectric polymers not only enables us to gain deeper insight into the mysterious blue color of the Morpho butterfly wings, but also breaks through the bottleneck in technical development toward broad applications in gas/liquid sensors, 3D meta-materials, coloring media, and infrared imaging devices, etc.

Photon nanojet lens: design, fabrication and characterization.

In this paper, a novel nanolens with super resolution, based on the photon nanojet effect through dielectric nanostructures in visible wavelengths, is proposed. The nanolens is made from plastic SU-8, consisting of parallel semi-cylinders in an array. This paper focuses on the lens designed by numerical simulation with the finite-difference time domain method and nanofabrication of the lens by grayscale electron beam lithography combined with a casting/bonding/lift-off transfer process. Monte Carlo simulation for injected charge distribution and development modeling was applied to define the resultant 3D profile in PMMA as the template for the lens shape. After the casting/bonding/lift-off process, the fabricated nanolens in SU-8 has the desired lens shape, very close to that of PMMA, indicating that the pattern transfer process developed in this work can be reliably applied not only for the fabrication of the lens but also for other 3D nanopatterns in general. The light distribution through the lens near its surface was initially characterized by a scanning near-field optical microscope, showing a well defined focusing image of designed grating lines. Such focusing function supports the great prospects of developing a novel nanolithography based on the photon nanojet effect.

Gold nanopillar arrays as biosensors fabricated by electron beam lithography combined with electroplating.

We report our work on the development of subwavelength gold pillar arrays as local surface plasmonic (LSP) resonators for sensor applications. These arrays are fabricated by electron beam lithography combined with electroplating. The conical shape, instead of flat one, on the top of Au pillars, induced by uneven current density in the plating, may affect the LSP resonance (LSPR). This paper aims to carry out a systematic study of LSPR behavior in nanopillar arrays with both flat and conical shapes on the top, trying to prove the feasibility of the developed nanoprocess. Both numerical simulations by the finite-difference time-domain (FDTD) method and experimental characterization on fabricated LSP resonators for reflectance spectra were carried out. Our experiments indicate that the fabricated nanopillar arrays in Au demonstrate the promising capability of refractive index sensing with sensitivity of 270 nm/refractive index unit. FDTD simulation of electric field density in the gap between pillars reveals the correlation between the resonant absorption of the incident light and the standing waves of localized surface plasmon polaritons in the gaps of the pillar array, despite the conical shape of the pillars. Moreover, it was discovered that the resonant absorption becomes stronger when the light incident angle is increased. The proposed nanoprocess for pillar arrays should possess great prospects for manufacturing Au pillars with high aspect ratio for achieving higher sensitivity at an economical cost.

Patterning the mechanical properties of hydrogen silsesquioxane films using electron beam irradiation for application in mechano cell guidance.

Hydrogen silsesquioxane (HSQ) is a material with the potential for studying the effect of surface stiffness on stem cell differentiation. Here, the effects of electron beam dose on the topography and the mechanical properties of HSQ obtained with or without trimethylamine (TMA) development are characterised by atomic force microscopy imaging and indentation. A correlation between the surface stiffness (uniform across the sample) and electron beam exposure is observed. Surface roughness of HSQ samples developed in TMA decreases exponentially with increasing electron beam exposure. Surface coating with plasma polymerised allylamine (ppAAm) leads to an overall decrease in stiffness values. However, the increase in surface stiffness with increasing electron beam exposure is still evident. The ppAAm coating is shown to facilitate human mesenchymal stem cell adhesion.

A new chemically amplified resist for high resolution patterning by E-beam lithography.

In this work, we have undertaken evaluation of the lithography property of a recently available chemically amplified resist (CAR) resist, UV1116 supplied by Rohm and Haas Company. Systematic study of the EBL property such as sensitivity, contrast, high resolution limit and dense capability, as well as resistance to plasma dry etching has been carried out. In comparison with the performance of UVIII, we conclude that the UV1116 can be a good alternative with better lithography quality.

Fabrication of 150 nm half-pitch grating templates for nanoimprint lithography.

We present the fabrication of 150 nm half-pitch Si grating templates by reactive ion etch (RIE), which are used in nanoimprint lithography (NIL) for high groove density gratings in SU-8 plastic. The etch properties such as the etch rate, profile and etching selectivity of Si over Cr as etch mask were carefully studied. Under the optimum condition Si gratings with 150 nm in linewidth, 480 nm in height and nearly 90 degree in verticality of the sidewall have been achieved. 150 nm half-pitch gratings on SU-8 were then successfully imprinted using the fabricated templates. The diffraction pattern of zeroth and first order from the SU-8 gratings was observed using a 266 nm laser beam. The developed nanofabrication technique in this work is applicable not only for templates but also for other nanostructures in silicon.