AFM Characterization of Temperature Effect on the SU-8 Mechanical and Tribological Properties.

This study presents the effect of temperature on the mechanical and tribological properties of SU-8 polymer. The temperature of investigated samples increasing during testing and the variation of mechanical and tribological properties were monitored. The samples for tests were SU-8 hard baked at different temperatures. The hard bake temperature changes the mechanical and tribological properties of polymers. The aim of this research work is the reliability design improvement of SU-8 microstructures from electro-thermally actuated devices where a thermal gradient produces the softening and modification of SU-8 behavior. As a function of the hard baked temperature, different mechanical and tribological properties were experimentally determined using the atomic force microscopy (AFM) technique. The mechanical properties of interest are the modulus of elasticity and hardness. The investigated tribological properties involve the adhesion and friction forces. The modulus of elasticity and hardness decrease if the operating temperature increases based on the thermal relaxation of material and their viscoelastic behavior. The adhesion force between AFM tip and investigated samples increases if the operating temperature increases, respectively. The same evolution was experimentally observed in the case of friction force. Moreover, for the same testing temperature, the modulus of elasticity and hardness increase, and the adhesion and friction forces decrease if the SU-8 is hard baked at high temperature.

Metasurface Fabrication by Cryogenic and Bosch Deep Reactive Ion Etching.

The research field of metasurfaces has attracted considerable attention in recent years due to its high potential to achieve flat, ultrathin optical devices of high performance. Metasurfaces, consisting of artificial patterns of subwavelength dimensions, often require fabrication techniques with high aspect ratios (HARs). Bosch and Cryogenic methods are the best etching candidates of industrial relevance towards the fabrication of these nanostructures. In this paper, we present the fabrication of Silicon (Si) metalenses by the UV-Nanoimprint Lithography method and cryogenic Deep Reactive Ion Etching (DRIE) process and compare the results with the same structures manufactured by Bosch DRIE both in terms of technological achievements and lens efficiencies. The Cryo- and Bosch-etched lenses attain efficiencies of around 39% at wavelength λ = 1.50 µm and λ = 1.45 µm against a theoretical level of around 61% (for Si pillars on a Si substrate), respectively, and process modifications are suggested towards raising the efficiencies further. Our results indicate that some sidewall surface roughness of the Bosch DRIE is acceptable in metalense fabrication, as even significant sidewall surface roughness in a non-optimized Bosch process yields reasonable efficiency levels.

Abelès method revisited.

The Abelès method is a classical method for determining the refractive index of dielectric thin films. In this paper we examine the main features of the method in a formal manner, using closed-form equations, and we show that the method is ambiguous in certain yet unreported situations.