Large Aperture and Wedged Multilayer Laue Lens for X-ray Nanofocusing.

Diffraction optics fabricated from multilayers offer an intriguing alternative to lithography-based zone plates due to their advantages of virtually limitless aspect ratio and extremely small feature size. However, other issues, intrinsic to thin-film deposition, such as film stress and deposition rate instability, for example, limit the total achievable aperture. Over the last decade, Multilayer Laue Lens (MLLs) have progressed from a mere curiosity with initial aperture sizes in the 3-10 µm range, to real beamline-deployed optics with apertures in the 40-50 µm range (X. Huang, et al., Scientific Reports 3, 3562 (2013); E. Nazaretski, et al., Rev. Sci. Instrum. 85, 033707 (2014); E. Nazaretski, et al., Journal of Synchrotron Radiation 24, 1113 (2017)). By optimizing deposition conditions and incorporating new materials, MLLs have now broken the 100 µm thickness milestone. A flat WSi2/Al-Si MLL with a deposition thickness of 102 µm, the largest MLL to date, is reviewed. New large aperture wedged MLLs (wMLL), which were first fabricated by APS in 2006 using the WSi2/Si material system, are presented which demonstrate high focusing efficiency across a broad energy range. These results confirm findings by other groups who have also independently fabricated wMLL (A. J. Morgan, et al., Scientific Reports 5, 9892 (2015); S. Bajt, et al., Nature Light: Science and Applications 7, 17162 (2017)) based on a similar material system.

Measurement of X-ray Beam Coherence along Multiple Directions Using 2-D Checkerboard Phase Grating.

A procedure for a technique to measure the transverse coherence of synchrotron radiation X-ray sources using a single phase grating interferometer is reported. The measurements were demonstrated at the 1-BM bending magnet beamline of the Advanced Photon Source (APS) at Argonne National Laboratory (ANL). By using a 2-D checkerboard π/2 phase-shift grating, transverse coherence lengths were obtained along the vertical and horizontal directions as well as along the 45° and 135° directions to the horizontal direction. Following the technical details specified in this paper, interferograms were measured at different positions downstream of the phase grating along the beam propagation direction. Visibility values of each interferogram were extracted from analyzing harmonic peaks in its Fourier Transformed image. Consequently, the coherence length along each direction can be extracted from the evolution of visibility as a function of the grating-to-detector distance. The simultaneous measurement of coherence lengths in four directions helped identify the elliptical shape of the coherence area of the Gaussian-shaped X-ray source. The reported technique for multiple-direction coherence characterization is important for selecting the appropriate sample size and orientation as well as for correcting the partial coherence effects in coherence scattering experiments. This technique can also be applied for assessing coherence preserving capabilities of X-ray optics.

Development and implementation of a portable grating interferometer system as a standard tool for testing optics at the Advanced Photon Source beamline 1-BM.

We developed a portable X-ray grating interferometer setup as a standard tool for testing optics at the Advanced Photon Source (APS) beamline 1-BM. The interferometer can be operated in phase-stepping, Moiré, or single-grating harmonic imaging mode with 1-D or 2-D gratings. All of the interferometer motions are motorized; hence, it is much easier and quicker to switch between the different modes of operation. A novel aspect of this new instrument is its designed portability. While the setup is designed to be primarily used as a standard tool for testing optics at 1-BM, it could be potentially deployed at other APS beamlines for beam coherence and wavefront characterization or imaging. The design of the interferometer system is described in detail and coherence measurements obtained at the APS 34-ID-E beamline are presented. The coherence was probed in two directions using a 2-D checkerboard, a linear, and a circular grating at X-ray energies of 8 keV, 11 keV, and 18 keV.

Probing transverse coherence of x-ray beam with 2-D phase grating interferometer.

Transverse coherence of the x-ray beam from a bending magnet source was studied along multiple directions using a 2-D π/2 phase grating by measuring interferogram visibilities at different distances behind the grating. These measurements suggest that the preferred measuring orientation of a 2-D checkerboard grating is along the diagonal directions of the square blocks, where the interferograms have higher visibility and are not sensitive to the deviation of the duty cycle of the grating period. These observations are verified by thorough wavefront propagation simulations. The accuracy of the measured coherence values was also validated by the simulation and analytical results obtained from the source parameters. In addition, capability of the technique in probing spatially resolved local transverse coherence is demonstrated.

Oxidation of PtNi nanoparticles studied by a scanning X-ray fluorescence microscope with multi-layer Laue lenses.

We report a study of the oxidation process of individual PtNi nanoparticles (NPs) conducted with a novel scanning multi-layer Laue lens X-ray microscope. The elemental maps reveal that alloyed PtNi NPs were transformed into Pt/NiO core-shell NPs by thermal oxidation. The observations furthermore indicate that a coalescence of Pt/NiO core-shell NPs occurred during oxidation.

Heat bump on a monochromator crystal measured with X-ray grating interferometry.

Deformation of the first crystal of an X-ray monochromator under the heat load of a high-power beam, commonly referred to as `heat bump', is a challenge frequently faced at synchrotron beamlines. Here, quantitative measurements of the deformations of an externally water-cooled silicon (111) double-crystal monochromator tuned to a photon energy of 17.6 keV are reported. These measurements were made using two-dimensional hard X-ray grating interferometry, a technique that enables in situ at-wavelength wavefront investigations with high angular sensitivity. The observed crystal deformations were of the order of 100 nm in the meridional and 5 nm in the sagittal direction, which lead to wavefront slope errors of up to 4 µrad in the meridional and a few hundred nanoradians in the sagittal direction.

Two dimensional hard x-ray nanofocusing with crossed multilayer Laue lenses.

Hard x-ray microscopy with nanometer resolution will open frontiers in the study of materials and devices, environmental sciences, and life sciences by utilizing the unique characterization capabilities of x-rays. Here we report two-dimensional nanofocusing by multilayer Laue lenses (MLLs), a type of diffractive optics that is in principle capable of focusing x-rays to 1 nm. We demonstrate focusing to a 25 × 27 nm(2) FWHM spot with an efficiency of 2% at a photon energy of 12 keV, and to a 25 × 40 nm(2) FWHM spot with an efficiency of 17% at a photon energy of 19.5 keV.

Reconstruction of an astigmatic hard X-ray beam and alignment of K-B mirrors from ptychographic coherent diffraction data.

We have used coherent X-ray diffraction experiments to characterize both the 1-D and 2-D foci produced by nanofocusing Kirkpatrick-Baez (K-B) mirrors, and we find agreement. Algorithms related to ptychography were used to obtain a 3-D reconstruction of a focused hard X-ray beam waist, using data measured when the mirrors were not optimally aligned. Considerable astigmatism was evident in the reconstructed complex wavefield. Comparing the reconstructed wavefield for a single mirror with a geometrical projection of the wavefront errors expected from optical metrology data allowed us to diagnose a 40 µrad misalignment in the incident angle of the first mirror, which had occurred during the experiment. Good agreement between the reconstructed wavefront obtained from the X-ray data and off-line metrology data obtained with visible light demonstrates the usefulness of the technique as a metrology and alignment tool for nanofocusing X-ray optics.

Observation of the Talbot effect using broadband hard x-ray beam.

We demonstrated the Talbot effect using a broadband hard x-ray beam (Δλ/λ ~1). The exit wave-field of the x-ray beam passing through a grating with a sub micro-meter scale period was successfully replicated and recorded at effective Talbot distance, Z(T). The period was reduced to half at Z(T)/4 and 3/4Z(T), and the phase reversal was observed at Z(T)/2. The propagating wave-field recorded on photoresists was consistent with a simulated result.

Wedged multilayer Laue lens.

A multilayer Laue lens (MLL) is an x-ray focusing optic fabricated from a multilayer structure consisting of thousands of layers of two different materials produced by thin-film deposition. The sequence of layer thicknesses is controlled to satisfy the Fresnel zone plate law and the multilayer is sectioned to form the optic. An improved MLL geometry can be created by growing each layer with an in-plane thickness gradient to form a wedge, so that every interface makes the correct angle with the incident beam for symmetric Bragg diffraction. The ultimate hard x-ray focusing performance of a wedged MLL has been predicted to be significantly better than that of a nonwedged MLL, giving subnanometer resolution with high efficiency. Here, we describe a method to deposit the multilayer structure needed for an ideal wedged MLL and report our initial deposition results to produce these structures.

Sectioning of multilayers to make a multilayer Laue lens.

We report a process to fabricate multilayer Laue lenses (MLL's) by sectioning and thinning multilayer films. This method can produce a linear zone plate structure with a very large ratio of zone depth to width (e.g., >1000), orders of magnitude larger than can be attained with photolithography. Consequently, MLL's are advantageous for efficient nanofocusing of hard x rays. MLL structures prepared by the technique reported here have been tested at an x-ray energy of 19.5 keV, and a diffraction-limited performance was observed. The present article reports the fabrication techniques that were used to make the MLL's.

Wave-optical simulation of hard-x-ray nanofocusing by precisely figured elliptical mirrors.

Computer simulations of nanofocusing by elliptical mirrors are presented wherein the diffraction and propagation of coherent hard x rays are predicted using wave-optical calculations. Surface height data acquired via microstitching interferometry were used to calculate the complex pupil function of a mirror, taking into account the Fresnel reflectivity and treating the surface topography as an aberration to a perfect elliptical mirror. The reflected wave-field amplitude and phase downstream of the mirror were obtained by numerically evaluating the Fresnel-Kirchhoff diffraction integral. Simulated intensity profiles and contours (isophotes) around the focal plane are presented for coherent illumination by a 15 keV point source, which indicate nearly diffraction-limited focusing at the 40 nm level. The effect of high spatial frequency microroughness on nanofocusing was investigated by low-pass filtering the Fourier spectrum of the residual height profile. Simulations using the filtered metrology data confirmed that roughness length scales shorter than 0.1 mm have a minor effect on the focal spot size and intensity.